Flourine-containing compound, substrate for patterning, photodegradable coupling agent, patterning method, and compound

Abstract

A fluorine-containing compound represented by General formula (1), wherein X represents a halogen atom or an alkoxy group, R 1 represents a hydrogen atom or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, R f1 and R f2 are each independently a fluorinated alkoxy group, and n represents an integer of 0 or more.

1 . A fluorine-containing compound represented by the following General formula (1): 
       
         
           
           
               
               
           
         
         wherein X represents a halogen atom or an alkoxy group, 
         R 1  represents a hydrogen atom or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, 
         R f1  and R f2  are each independently a fluorinated alkoxy group, and 
         n represents an integer of 0 or more. 
       
     
     
         2 . A substrate for patterning, having a surface chemically modified with the fluorine-containing compound according to  claim 1 . 
     
     
         3 . A photodegradable coupling agent consisted of the fluorine-containing compound according to  claim 1 . 
     
     
         4 . A patterning method for forming a pattern on a surface to be treated of an object, comprising:
 a first step of chemically modifying the surface to be treated using the fluorine-containing compound according to  claim 1 ;   a second step of producing a latent image formed of a hydrophilic region and a water-repellent region by irradiating the chemically modified surface to be treated with light having a predetermined pattern; and   a third step of disposing a patterning material on the hydrophilic region or the water-repellent region.   
     
     
         5 . A patterning method for forming a circuit pattern for an electronic device on a flexible substrate, comprising:
 a first step of chemically modifying the entire surface or a specific region of the substrate using the fluorine-containing compound according to  claim 1 ;   a second step of producing a latent image of the circuit pattern on the surface of the substrate by using the difference in the hydrophilicity and the water repellency by irradiating the surface of the chemically modified substrate with light energy having a distribution corresponding to the circuit pattern; and   a third step of bringing the flexible patterning material into contact with the latent image portion on the surface of the substrate, and thereby capturing the patterning material in the shape of the circuit pattern by using the difference in the hydrophilicity and the water repellency.   
     
     
         6 . The patterning method according to  claim 4 , wherein the patterning material includes a liquid conductive material, a liquid semiconductor material, or a liquid insulating material. 
     
     
         7 . The patterning method according to  claim 4 , wherein the light includes light at a wavelength in the range of 200 nm to 450 nm. 
     
     
         8 . A compound represented by the following General formula (f): 
       
         
           
           
               
               
           
         
         wherein R 1  represents a hydrogen atom or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, and R f1  and R f2  are each independently a fluorinated alkoxy group.