US2016218269A1PendingUtilityA1

METHOD FOR FORMING RF-PROPERTIES-OPTIMIZED COMPOSITIONS OF (RE) Ba2Cu3O7-delta THIN FILM SUPERCONDUCTORS

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Assignee: MOECKLY BRIANPriority: Dec 23, 2004Filed: Dec 22, 2015Published: Jul 28, 2016
Est. expiryDec 23, 2024(expired)· nominal 20-yr term from priority
H01L 39/2461H01L 39/128H01L 39/143H01L 39/2438Y10T428/24355H01F 6/00Y10S505/778Y10T428/24942Y10T428/26C04B 35/4508C04B 2235/3215Y10T428/266Y10S505/78Y10S505/779H01B 1/08H01P 1/20381H01P 1/20336Y10S505/776H01B 12/00C04B 2235/3224C04B 2235/96Y10S505/777C04B 2235/85H10N 60/203H10N 60/0436H10N 60/857H10N 60/0576H10N 60/0632H10N 60/0604H10N 60/0381H10N 60/858H10N 60/00
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Claims

Abstract

The films of this invention are high temperature superconducting (HTS) thin films specifically optimized for microwave and RF applications. In particular, this invention focuses on compositions with a significant deviation from the 1:2:3 stoichiometry in order to create the films optimized for microwave/RF applications. The RF/microwave HTS applications require the HTS thin films to have superior microwave properties, specifically low surface resistance, R s , and highly linear surface reactance, X s , i.e. high J IMD . As such, the invention is characterized in terms of its physical composition, surface morphology, superconducting properties, and performance characteristics of microwave circuits made from these films.

Claims

exact text as granted — not AI-modified
We claim: 
     
         1 . A method for forming a superconducting article comprising the steps of:
 providing a substrate,   providing at least one buffer layer supported by the substrate, and   depositing by reactive coevaporation a thin film on the substrate having the nominal composition of RE 2 Ba y Cu 3 O x      wherein RE is a rare earth, wherein the ratio of y/z is 1.65±10% and x is between 6 and 7 inclusive,   wherein the thin film has a superconducting transition temperature of <95K, and   wherein the article including 45-degree grain boundaries in a concentration of <1%.   
     
     
         2 . The method for forming a superconducting article of  claim 1  wherein the thin film has a superconducting transition temperature ≦87K. 
     
     
         3 . The method for forming a superconducting article of  claim 1  wherein the substrate is lattice matched to the thin film. 
     
     
         4 . The method for forming a superconducting article of  claim 1  having an RMS surface roughness of less than about 10 nm. 
     
     
         5 . The method for forming a superconducting article of  claim 1  wherein the topmost buffer layer is lattice matched to the thin film. 
     
     
         6 . The method for forming a superconducting article of  claim 1  wherein one of the buffer layers is MgO. 
     
     
         7 . The method for forming a superconducting article of  claim 1  wherein one of the buffer layers is Al 2 O 3 . 
     
     
         8 . The method for forming a superconducting article of  claim 1  wherein the substrate is a single crystal. 
     
     
         9 . The method for forming a superconducting article of  claim 1  wherein the substrate is selected from the group consisting of: MgO, Al 2 O 3 , LaAlO 3 , NdGaO 3 , (La 0.18 Sr 0.82 )(Al 0.59 Ta 0.41 )O 3 , and SrTiO 3 . 
     
     
         10 . The method for forming a superconducting article of  claim 1  wherein the substrate has a thermal expansion match to the thin film. 
     
     
         11 . The method for forming a superconducting article of  claim 1  wherein the substrate has a surface area >3 square inches. 
     
     
         12 . The method for forming a superconducting article of  claim 1  containing a-axis-oriented grains in a concentration of >1% relative to c-axis-oriented grains.

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