Post-treatment method of film-coated member

Abstract

Provided is a post-treatment method of a film-coated member, the method including heating an electrically conductive film provided on at least one surface of a substrate by applying pressure to a member including the substrate and the film and applying a high-frequency direct current pulse to the film, wherein the pressure is applied in a direction having a normal-vector-direction component of a layer of the film.

What is claimed is: 
     
         1 . A post-treatment method of a film-coated member, the method comprising:
 applying a pressure to a member including a substrate and an electrically conductive film on at least a surface of the substrate; and   heating the film by applying a high-frequency direct current pulse to the film,   wherein the pressure is applied in a direction having a component along a direction of a normal vector to a layer on which the film is disposed.   
     
     
         2 . The post-treatment method of  claim 1 ,
 wherein the film is formed by thermal spraying.   
     
     
         3 . The post-treatment method of  claim 2 ,
 wherein the thermal spraying includes at least one of gas flame thermal spraying, arc thermal spraying, plasma thermal spraying, detonation thermal spraying, vacuum plasma spraying, and high velocity oxy-fuel spraying.   
     
     
         4 . The post-treatment method of  claim 1 ,
 wherein the film includes tungsten.   
     
     
         5 . The post-treatment method of  claim 1 ,
 wherein the heating comprises heating the film to a temperature of about 900° C. to about 1100° C.   
     
     
         6 . The post-treatment method of  claim 1 ,
 wherein the heating comprises applying a pulsed current of up to 4000 A and 20 kHz.   
     
     
         7 . The post-treatment method of  claim 1 ,
 wherein the substrate is an electrical conductor, and   wherein electrodes for applying the high-frequency direct current pulse are provided in such a manner that one of the electrodes contacts the substrate and the other of the electrodes contacts the film.   
     
     
         8 . The post-treatment method of  claim 1 ,
 wherein the heating comprises applying a pulsed current having a current density from 50 A/mm 2  to 250 A/mm 2 , to the film.