US2016293874A1PendingUtilityA1
Photoelectric conversion device and method of manufacturing the same
Est. expiryMar 30, 2035(~8.7 yrs left)· nominal 20-yr term from priority
Y02E10/549H10K 30/50H10K 30/30H10K 71/15H01L 51/0035H01L 51/0026H01L 51/4253H01L 51/0037H01L 51/005H01L 51/0046H01L 51/0043H10K 85/113H10K 85/151H10K 2102/103H10K 85/211H10K 71/40Y02P70/50
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Abstract
A method of manufacturing a photoelectric conversion device of an embodiment includes: forming a layer on a substrate; and drying this layer. The layer contains a p-type semiconductor, an n-type semiconductor, and a compound represented by the following formula (1). The layer is dried under pressures of 100 Pa or less and substrate temperatures of 40 to 200° C. R 1 —(CH 2 ) n —R 2 (1) Here, n: 1 to 20, and R1, R2: halogen or SH
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A method of manufacturing a photoelectric conversion device, comprising:
forming a layer containing a p-type semiconductor, an n-type semiconductor, and a compound represented by the following formula (1) on a substrate; and drying the layer under pressures of 100 Pa or less and substrate temperatures of 40 to 200° C.
R 1 —(CH 2 ) n —R 2 (1)
n: 1 to 20 R1, R2: halogen or SH
2 . The method of claim 1 ,
wherein the pressures are 1×10 −3 Pa or less and the temperatures are 40 to 160° C.
3 . The method of claim 1 ,
wherein: the dried layer has a microphase-separated structure of the p-type semiconductor and the n-type semiconductor; the p-type semiconductor has a polymer; and the n-type semiconductor has a fullerene derivative.
4 . The method of claim 1 ,
wherein the compound is 1,8-diiodooctane.
5 . A photoelectric conversion device, comprising:
a first electrode layer; a second electrode layer; and a photoelectric conversion layer disposed between the first and second electrode layers and including an organic active layer, the organic active layer containing a p-type semiconductor, an n-type semiconductor, and a compound represented by the following formula (1), and a concentration of the compound being 0.001 mass % or more to less than 0.1 mass %.
R 1 —(CH 2 ) n —R 2 (1)
n: 1 to 20 R1, R2: halogen or SH
6 . The photoelectric conversion device of claim 5 ,
wherein the photoelectric conversion layer has a microphase-separated structure of the p-type semiconductor and the n-type semiconductor, the p-type semiconductor has a polymer; and the n-type semiconductor has a fullerene derivative.
7 . The photoelectric conversion device of claim 5 ,
wherein the compound is 1,8-diiodooctane.Cited by (0)
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