Aqueous surfactant compositions
Abstract
What is proposed is aqueous surfactant compositions comprising one or more alpha-sulfo fatty acid disalts (A) of the general formula (I), R 1 CH(SO 3 M 1 )COOM 2 (I) in which the radical R 1 is a linear or branched alkyl or alkenyl radical with 6 to 16 carbon atoms and the radicals M 1 and M 2 —independently of one another—are selected from the group H, Li, Na, K, Ca/2, Mg/2, ammonium and alkanolamine, one or more alkyl glycosides (B) of the general formula (II), R 2 O—[G] p (I) in which R 2 is an alkyl and/or alkenyl radical with 8 to 18 carbon atoms, G is a sugar radical with 5 or 6 carbon atoms and p is numbers between 1 and 10, and water, where specific limiting conditions are to be observed. These compositions have excellent foaming ability and are suitable for use in cosmetic products.
Claims
exact text as granted — not AI-modified1 . An aqueous surfactant composition comprising
one or more alpha-sulfo fatty acid disalt (A) of general formula (I),
R 1 CH(SO 3 M 1 )COOM 2 (I)
in which radical R 1 is a linear or branched alkyl or alkenyl radical with 6 to 16 carbon atoms and the radicals M 1 and M 2 , independently of one another, are selected from the group consisting of H, Li, Na, K, Ca/2, Mg/2, ammonium, and alkanolamine,
one or more alkyl glycosides (B) of general formula (II),
R 2 O—[G] p (II),
in which R 2 is an alkyl and/or alkenyl radical with 8 to 18 carbon atoms, G is a sugar radical with 5 or 6 carbon atoms and p is numbers between 1 and 10,
water,
where the following provisos apply:
with regard to the compound (A), it is the case that a fraction of the compound (A) in which the radical R 1 is an alkyl or alkenyl radical with 14 or more carbon atoms, based on the total amount of the compound (A) in the aqueous surfactant composition, is 20% by weight or less;
with regard to the compound (B), it is the case that a fraction of the compound (B) in which the radical R 2 is an alkyl or alkenyl radical with 15 or more carbon atoms, based on the total amount of the compound (B) in the aqueous surfactant composition, is 5% by weight or less;
if the aqueous surfactant composition comprises one or more ester sulfonate (E) of general formula (V),
R 5 CH(SO 3 M 5 )COOR 6 (V)
in which radical R 5 is a linear or branched alkyl or alkenyl radical with 6 to 18 carbon atoms and radical R 6 is a linear or branched alkyl or alkenyl radical with 1 to 20 carbon atoms, and the radical M 5 is selected from the group consisting of Li, Na, K, Ca/2, Mg/2, ammonium and alkanolamine, it is the case that the compound (A), based on the totality of the compounds (A) and (E), is present to 50% by weight or more;
a weight ratio of the compounds (A):(B) in the aqueous surfactant composition is in the range from 0.6:1 to 1:0.6.
2 . The composition according to claim 1 , where the radicals M 1 and M 2 are Na.
3 . The composition according to claim 1 , wherein the composition additionally comprises one or more compound (C) of general formula (III),
R 4 COOM 3 (III),
in which the radical R 4 is a linear or branched alkyl or alkenyl radical with 7 to 19 carbon atoms and the radical M 3 is selected from the group consisting of H, Li, Na, K, Ca/2, Mg/2, ammonium, and alkanolamine.
4 . The composition according to claim 1 , wherein the composition additionally comprises one or more inorganic salt of sulfuric acid (D) of general formula (IV),
(M 4 )2SO 4 (IV)
wherein M 4 is selected from the group consisting of Li, Na, K, Ca/2, Mg/2, ammonium, and alkanolamine.
5 . The composition according to claim 1 , wherein a pH of the composition is in the range from 4.3 to 5.8.
6 . A cosmetic product comprising a composition according claim 1 .
7 . The cosmetic product according to claim 6 in the form of hair shampoos, shower gels, soaps, syndets, washing pastes, washing lotions, scrub preparations, foam baths, oil baths, shower baths, shaving foams, shaving lotions, and shaving creams.
8 . The composition according to claim 1 wherein the radical R 6 is an alkenyl radical or is branched above 3 carbon atoms.Cited by (0)
No later patents cite this yet.
References (0)
No backward citations on record.