US2017057162A1PendingUtilityA1

High Resolution Projection Micro-Stereolithography System And Method

Individually held — no corporate assignee on recordPriority: May 28, 2010Filed: Nov 15, 2016Published: Mar 2, 2017
Est. expiryMay 28, 2030(~3.9 yrs left)· nominal 20-yr term from priority
G03H 2223/17G03H 2001/0094B29C 67/0066G03H 2225/60G03H 1/0476B33Y 10/00G02B 5/008G02B 27/56G02B 1/007G03H 1/0005G03H 2001/0482B33Y 30/00G03F 7/70408B29C 64/124G02B 1/002G03F 7/70416G03H 1/2294B29C 64/135
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Claims

Abstract

A high-resolution PμSL system and method incorporating one or more of the following features with a standard PμSL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a PμSL system to fabricate microstructures of different materials.

Claims

exact text as granted — not AI-modified
We claim: 
     
         1 . A holographic projection micro-stereolithography (PμSL) system, comprising:
 a bath containing a photosensitive resin; and 
 at least two light projection systems, each projection system comprising a light source; and a spatial light modulator (SLM) adapted to produce a digital image when illuminated by the light source, 
 wherein the at least two light projection systems are arranged to holographically interfere said digital images in the photosensitive resin to volumetrically cure select regions thereof in a holographic interference pattern. 
 
     
     
         2 . The holographic projection micro-stereolithography (PμSL) system of  claim 1 ,
 wherein each light projection system further comprises a reduction lens, and a far-field superlens (FSL) contactedly interfacing the photosensitive resin, said FSL including a dielectric layer and a metal grating layer, and wherein the FSL is arranged to convert a far-field image produced by the SLM and reduced by the reduction lens into a near-field image for volumetrically curing the select regions of the photosensitive resin. 
 
     
     
         3 . A holographically-controlled volumetric curing method of photosensitive resin, comprising:
 providing a bath containing a photosensitive resin, and at least two light projection systems, each light projection system comprising a light source and a spatial light modulator (SLM) adapted to produce a corresponding digital image when illuminated by the light source;   activating the light projection systems to produce the digital images; and   directing the digital images of the light projection systems to holographically interfere in the photosensitive resin so as to volumetrically cure select regions thereof in a holographic interference pattern.   
     
     
         4 . The method of  claim 3 ,
 wherein each light projection system further comprises a reduction lens, and a far-field superlens (FSL) contactedly interfacing the photosensitive resin, said FSL including a dielectric layer and a metal grating layer, and wherein the FSL is arranged to convert a far-field image produced by the SLM and reduced by the reduction lens into a near-field image for volumetrically curing the select regions of the photosensitive resin.

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