Apparatus and method for nanocomposite sensors

Abstract

A sensing material for use in a sensor is disclosed. Such a sensing material includes a polymer base and a piezoresistive nanocomposite embedded into the polymer base in a continuous pattern. The nanocomposite comprises a polymer matrix and a plurality of conductive nanofillers suspended in the matrix. The conductive nanofillers may be one or a combination of nanotubes, nanowires, particles and flakes. The density of the plurality of nanofillers is such that the nanocomposite exhibits conductivity suitable for electronic and sensor applications.

What is claimed is: 
     
         1 . An apparatus, comprising:
 a polymer base having at least one edge;   a nanocomposite embedded in the polymer base in a continuous pattern having a first end and a second end;   a first electrical terminal; and   a second electrical terminal,   wherein the first electrical contact contacts with the first end of the nanocomposite pattern, wherein the second electrical contact contacts the second end of the nanocomposite pattern, and the nanocomposite includes a polymer matrix and a plurality of at least one of conductive nanotubes, conductive nanowires, conductive particles and conductive flakes suspended in the polymer matrix,   wherein the density of the plurality of the at least one of nanotubes, nanowires, particles and flakes is such that the nanocomposite is conductive; and   wherein the first and second electrical terminals are configured for the measurement of at least one of a voltage, a current and a resistance across the patterned pizeoresistive nanocomposite.   
     
     
         2 . The apparatus of  claim 1 , wherein the continuous pattern is one of a line, a curve or a combination thereof. 
     
     
         3 . The apparatus of  claim 1 , wherein the polymer base is an elastomeric polymer. 
     
     
         4 . The apparatus of  claim 1 , wherein the polymer base comprises at least one of polydimethylsiloxane (PDMS), silicone elastomer, vinyl acetate, ethylene propylene rubber, polyimide, polytetrafluoroethylene (PTFE), poly(p-xylylene) polymer, fluorocarbon-based polymer, and poly(methyl methacrylate) (PMMA). 
     
     
         5 . The apparatus of  claim 1 , wherein the polymer matrix is an elastomeric polymer. 
     
     
         6 . The apparatus of  claim 1 , wherein the polymer matrix comprises at least one of polydimethylsiloxane (PDMS), silicone elastomer, vinyl acetate, ethylene propylene rubber, polyimide, polytetrafluoroethylene (PTFE), poly(p-xylylene) polymer, fluorocarbon-based polymer, and poly(methyl methacrylate) (PMMA). 
     
     
         7 . The apparatus of  claim 1 , wherein the plurality of the at least one of nanotubes, nanowires, particles and flakes is uniformly distributed in the polymer matrix. 
     
     
         8 . The apparatus of  claim 1 , wherein the nanocomposite is configured such that malformation of the polymer base yields a corresponding change to the resistance of the nanocomposite pattern. 
     
     
         9 . The apparatus of  claim 1 , further comprising a device configured to measure the resistance across the nanocomposite pattern between the first end and the second end. 
     
     
         10 . The apparatus of  claim 9 , wherein the device for measuring the resistance across the nanocomposite pattern is one of an ohmmeter and a multimeter. 
     
     
         11 . The apparatus of  claim 9 , further comprising a device configured to store a plurality of resistance measurements over time. 
     
     
         12 . The apparatus of  claim 11 , wherein the device configured to store a plurality of resistance measurements over time is one of a microprocessor, a computer, or electronic storage media. 
     
     
         13 . The apparatus of  claim 11 , wherein the device configured to store a plurality of resistance measurements is further configured to convert a resistance measurement to at least one of a pressure measurement, a strain measurement and a location measurement. 
     
     
         14 . The apparatus of  claim 13 , wherein the device configured to store and convert resistance measurements is one of a microprocessor, a computer and a programmable logic controller. 
     
     
         15 . The apparatus of  claim 13 , wherein the apparatus is configured to detect a pressure change of at least 1 Pa.