Bipolar plate with force concentrator pattern

Abstract

Embodiments of present disclosure are directed to a bipolar plate assembly. The bipolar plate assembly has a frame and a base. At least one of the frame and the base has a shape of a force concentrator pattern or has a first surface having a force concentrator pattern, the force concentrator pattern including a raised surface extending partially across the first surface. A surface area of the force concentrator pattern across the length of the frame or base is generally constant, thereby producing a uniform compressive pressure along the length of the frame or base when the bipolar plate assembly is under compression.

What is claimed is: 
     
         1 . A bipolar plate assembly, comprising:
 a frame and a base, at least one of the frame and the base having a shape of a force concentrator pattern or having a first surface comprising a force concentrator pattern, the force concentrator pattern comprising a raised surface extending partially across the first surface;   wherein a surface area of the force concentrator pattern across the length of the frame or the base is generally constant, thereby producing a uniform compressive pressure along the length of the frame and/or the base when the bipolar plate assembly is under compression.   
     
     
         2 . The bipolar plate assembly of  claim 1 , wherein the surface area of the force concentrator pattern across the length of the frame or the base ranges from between about 2 cm 2 /cm to about 10 cm 2 /cm. 
     
     
         3 . The bipolar plate assembly of  claim 1 , further comprising at least one seal assembly between the frame and the base. 
     
     
         4 . The bipolar plate assembly of  claim 3 , wherein the seal assembly is an elastomer seal or a polymeric seal. 
     
     
         5 . The bipolar plate assembly of  claim 3 , wherein the compressive pressure on the seal assembly is generally evenly distributed across the seal assembly when the bipolar plate assembly is under compression. 
     
     
         6 . The bipolar plate assembly of  claim 1 , wherein the frame and the base are two pieces coupled together or are one integrated part. 
     
     
         7 . The bipolar plate assembly of  claim 6 , wherein at least one of the frame and the base is laminated with a polymeric material or coated with a polymeric film on a top surface and/or a bottom surface. 
     
     
         8 . The bipolar plate assembly of  claim 7 , wherein the compressive pressure on the polymeric material or the polymeric film is generally evenly distributed across the frame and/or the base when the bipolar plate assembly is under compression. 
     
     
         9 . The bipolar plate assembly of  claim 2 , wherein the bipolar plate assembly is at least one of a plurality of bipolar plate assemblies forming an electrochemical stack. 
     
     
         10 . The bipolar plate assembly of  claim 2 , wherein the compressive pressure ranges from 5,000 psig to 40,000 psig. 
     
     
         11 . The bipolar plate assembly of  claim 2 , wherein the force concentrator pattern has a thickness ranging from 0.025 mm to a thickness of the frame and/or the base. 
     
     
         12 . The bipolar plate assembly of  claim 2 , wherein at least one of the frame and the base has a second surface comprising the force concentrator pattern. 
     
     
         13 . A method of assembling a bipolar plate assembly, comprising:
 compressing a frame and a base of the bipolar plate assembly, at least one of the frame and the base having a shape of a force concentrator pattern or having a first surface comprising a force concentrator pattern, the force concentrator pattern comprising a raised surface extending partially across the first surface,   wherein a surface area of the force concentrator pattern across the length of the frame or the base is generally constant, thereby producing a uniform compressive pressure along the length of the frame and/or the base when the bipolar plate assembly is under compression.   
     
     
         14 . The method of  claim 13 , wherein the surface area of the force concentrator pattern across the length of the frame or the base ranges from between about 2 cm 2 /cm to about 10 cm 2 /cm. 
     
     
         15 . The method of  claim 13 , wherein the bipolar plate assembly comprises at least one seal assembly between the frame and the base. 
     
     
         16 . The method of  claim 15 , wherein the seal assembly is an elastomer seal or a polymeric seal. 
     
     
         17 . The method of  claim 15 , wherein the compressive pressure on the seal assembly is generally evenly distributed across the seal assembly when the bipolar plate assembly is under compression. 
     
     
         18 . The method of  claim 15 , wherein the compressive pressure on the seal assembly is greater than the yield strength of the material of the seal assembly. 
     
     
         19 . The method of  claim 13 , wherein the frame and the base are two pieces coupled together or are one integrated part;
 wherein at least one of the frame and the base is laminated with a polymeric material or coated with a polymeric film on a top surface and/or a bottom surface; and   wherein the compressive pressure on the polymeric material or the polymeric film is generally evenly distributed across the frame and/or the base when the bipolar plate assembly is under compression.   
     
     
         20 . An electrochemical cell comprising:
 a pair of bipolar plate assemblies and a membrane electrode assembly located between the pair of bipolar plate assemblies, wherein at least one of the bipolar plate assembly comprises:   a frame and a base, at least one of the frame and the base having a shape of a force concentrator pattern or having a first surface comprising a force concentrator pattern, the force concentrator pattern comprising a raised surface extending partially across the first surface,   wherein a surface area of the force concentrator pattern across the length of the frame or the base is generally constant, thereby producing a uniform compressive pressure along the length of the frame and/or base when the bipolar plate assembly is under compression.