Integrated pump control for dynamic control of plasma field

Abstract

A pump and pump controller which uses an algorithm to quickly achieve and maintain a stable plasma field in a surgical site are provided. The algorithm calculates an electrical characteristic value to determine if the suction rate by the pump should be increased or decreased to achieve a stable plasma field. A method of using such a pump and pump controller is also provided.

What is claimed is: 
     
         1 . A method of controlling a surgical pump system, the method comprising the steps of:
 providing a pump system for motivating fluid to and from a surgical site during a surgical procedure;   providing a pump controller connected to the pump system for controlling a fluid rate inflow to a surgical site and for controlling suction of fluid from a surgical site;   providing a surgical device for performing a surgical procedure, the surgical device having an associated electrical characteristic value at a given time;   providing a predetermined upper threshold electrical characteristic value and a predetermined lower threshold electrical characteristic value and communicating the upper threshold electrical characteristic value and the lower threshold electrical characteristic value to the pump controller;   providing a low suction amount value and communicating the low suction amount value to the pump controller; and   the pump controller performing the following steps:
 (a) retrieving and recording a sampling of surgical device electrical characteristic values, 
 (b) calculating an average electrical characteristic value based on the sampling of electrical characteristic values, 
 (c) increasing the amount of suction if the average electrical characteristic value is greater than the upper threshold electrical characteristic value, 
 (d) decreasing the amount of suction if the average electrical characteristic value is less than the lower threshold electrical characteristic value. 
   
     
     
         2 . The method of controlling a surgical pump system according to  claim 1 , and further comprising the step of initializing the suction value to zero if the surgical device was just activated. 
     
     
         3 . The method of controlling a surgical pump system according to  claim 1 , and further comprising the step of the pump controller setting a suction increment value. 
     
     
         4 . The method of controlling a surgical pump system according to  claim 3 , wherein the step of increasing the amount of suction comprises increasing suction using the suction increment value. 
     
     
         5 . The method of controlling a surgical pump system according to  claim 1 , wherein the step of retrieving and recording a sampling is performed for a predetermined amount of time. 
     
     
         6 . The method of controlling a surgical pump system according to  claim 1 , wherein the step of decreasing the amount of suction comprises decreasing the amount of suction to the low suction amount value. 
     
     
         7 . The method of controlling a surgical pump system according to  claim 3 , wherein the step of decreasing the suction comprises decreasing the suction using the suction increment value. 
     
     
         8 . The method of controlling a surgical pump system according to  claim 7 , wherein the suction is decreased to a rate not less than the low suction amount value. 
     
     
         9 . The method of controlling a surgical pump system according to  claim 1 , wherein if the measured electrical characteristic value is between the lower threshold electrical characteristic value and the upper threshold electrical characteristic value, the pump maintains the current suction rate. 
     
     
         10 . The method of controlling a surgical pump system according to  claim 1 , wherein if the suction rate calculated is lower than a predetermined lower suction rate value, then the suction rate is incrementally decreased until a stable plasma field is achieved. 
     
     
         11 . The method of controlling a surgical pump system according to  claim 6 , wherein the low suction amount level is maintained until the controller detects a stable plasma field. 
     
     
         12 . A method of controlling a pump to dynamically control a plasma field comprising the steps of:
 providing an RF device;   providing a fluid pump capable of providing suction from a surgical site at a suction rate;   providing a controller for receiving data from the RF device;   providing a lower threshold electrical characteristic value and an upper threshold electrical characteristic value to the controller;   measuring the electrical characteristic value used by the RF device;   communicating the RF device electrical characteristic value to the controller;   if the electrical characteristic value is below the lower threshold electrical characteristic value, the controller sending a signal to the fluid pump to reduce the suction rate by the fluid pump to increase the electrical characteristic value to a level above the lower threshold electrical characteristic value;   if the electrical characteristic value exceeds the upper threshold electrical characteristic value, the controller sending a signal to the fluid pump to incrementally increase the suction rate until the measured electrical characteristic value is between the lower threshold electrical characteristic value and the upper threshold electrical characteristic value.   
     
     
         13 . The method of controlling a pump according to  claim 12 , wherein if the measured electrical characteristic value is between the lower threshold electrical characteristic value and the upper threshold electrical characteristic value, the pump maintains the suction rate. 
     
     
         14 . The method of controlling a pump according to  claim 12 , wherein if the measured electrical characteristic value is lower than the lower threshold electrical characteristic value, then the suction rate is set to a suction base level value. 
     
     
         15 . The method of controlling a pump according to  claim 14 , wherein the suction base level value is maintained until a stable plasma field condition is achieved, then the suction rate is increased. 
     
     
         16 . The method of controlling a pump according to  claim 12 , wherein if an instable plasma field is detected, a predetermined amount of time must pass before the suction rate returns to a maximum value. 
     
     
         17 . The method of controlling a pump according to  claim 12 , wherein if the measured electrical is lower than the lower threshold voltage value, then the suction rate is incrementally decreased until a stable plasma field is achieved. 
     
     
         18 . The method of controlling a pump according to  claim 12 , wherein the electrical characteristic is voltage. 
     
     
         19 . A method of controlling a pump to dynamically control a plasma field comprising the steps of:
 providing an RF device with at least one electrode for generating plasma and a fluid port, the electrode generating an electrical signal;   providing an RF generator for providing RF energy to the RF device;   providing a fluid pump capable of providing a flow of fluid through the RF device;   providing a pump controller for controlling a rate of the flow of fluid from the fluid pump;   transferring data concerning the electrical signal between the RF generator and the pump controller; and   adjusting the rate of the flow of the fluid pump based on the electrical signal data.