US2017191165A1PendingUtilityA1

Method for producing plated article

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Assignee: OM SANGYO CO LTDPriority: Mar 24, 2015Filed: Mar 23, 2016Published: Jul 6, 2017
Est. expiryMar 24, 2035(~8.7 yrs left)· nominal 20-yr term from priority
C23C 18/1639C23C 18/18C23C 18/1868C23C 18/42C23C 18/1612C23C 18/38C23C 18/54C23C 18/1667C23C 18/1893C23C 18/32
25
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Claims

Abstract

There is provided a method for producing a plated article in which a plating film pattern is formed on the surface of a glass substrate, comprising a first step of irradiating a partial area of the surface of the glass substrate with a pulsed laser; a second step of attaching an electroless catalyst on the surface of the glass substrate; a third step of selectively deactivating or selectively removing the catalyst attached to the unirradiated area with the pulsed laser in the glass substrate; and a fourth step of nonelectrolytically plating the glass substrate after the third step to selectively form a plating film in the irradiated area with the pulsed laser. The method allows for easily producing a plated article in which a highly adherent plating film pattern is formed on the surface of the glass substrate.

Claims

exact text as granted — not AI-modified
1 . A method for producing a plated article in which a plating film pattern is formed on the surface of a glass substrate, comprising
 a first step of irradiating a partial area of the surface of the glass substrate with a pulsed laser;   a second step of attaching an electroless catalyst on the surface of the glass substrate;   a third step of selectively deactivating or selectively removing the catalyst attached to the unirradiated area with the pulsed laser in the glass substrate; and   a fourth step of nonelectrolytically plating the glass substrate after the third step to selectively form a plating film in the irradiated area with the pulsed laser,   wherein in the third step, the glass substrate contacts a solution containing a compound deactivating the catalyst or a compound removing the catalyst.   
     
     
         2 . The production method as claimed in  claim 1 , wherein a pulse width of the pulsed laser is 1×10 −18  to 1×10 −4  sec. 
     
     
         3 . The production method as claimed in  claim 1 , wherein the plating film is at least one selected from the group consisting of nickel, copper, silver, gold, palladium, platinum, rhodium, ruthenium, tin, iron, cobalt and alloys thereof. 
     
     
         4 . (canceled) 
     
     
         5 . The production method as claimed in  claim 1 , wherein in the third step, a compound deactivating the catalyst is a sulfur compound. 
     
     
         6 . The production method as claimed in  claim 5 , wherein the sulfur compound is a compound having at least one functional group selected from the group consisting of a thiocarbonyl group, a thiol group and a sulfide group. 
     
     
         7 . The production method as claimed in  claim 1 , wherein a compound removing the catalyst is a chelate compound or cyanide. 
     
     
         8 . The production method as claimed in  claim 7 , wherein the compound removing the catalyst is at least one chelate compound selected from the group consisting of an amino acid, an amino alcohol, a polyamine, a polycarboxylic acid and a polyketone.

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