Nanotube application deposition system for forming low defect nanotube fabrics

Abstract

The present disclosure provides methods for removing defects nanotube application solutions and providing low defect, highly uniform nanotube fabrics. In one aspect, a degassing process is performed on a suspension of nanotubes to remove air bubbles present in the solution. In another aspect, a continuous flow centrifugation (CFC) process is used to remove small scale defects from the solution. In another aspect, a depth filter is used to remove large scale defects from the solution. According to the present disclosure, these three methods can be used alone or combined to realize a low defect nanotube application solutions and fabrics.

What is claimed is: 
     
         1 . A system for forming uniform, low defect nanotube fabrics comprising:
 a solution intake element;   at least one degassing element;   at least one defect reduction process element; and   a solution deposition element;   wherein said system is configured such that a nanotube application solution supplied through said solution intake element is first processed through a series combination of said at least one degassing element and said at least one defect reduction process element, and then processed through said solution deposition element to provide a purified, degassed nanotube application solution.   
     
     
         2 . The system of  claim 1  wherein said system is configured such that a nanotube application solution remains in a degassed state as it is processed through said at least one defect reduction process element and said solution deposition element. 
     
     
         3 . The system of  claim 1  wherein said system is configured to process a nanotube application solution through said at least one defect reduction process element immediately subsequent to being processed through said at least one degassing element. 
     
     
         4 . The system of  claim 1  wherein said system is a point of use nanotube fabric deposition system. 
     
     
         5 . The system of  claim 4  wherein said system is capable of continuously processing a nanotube application solution through said solution intake element, said at least one degassing element, said at least one defect reduction process element, and said solution deposition element. 
     
     
         6 . The system of  claim 1  wherein said at least one defect reduction processing element includes at least one of a degassing element, a continuous flow centrifugation element, a batch centrifugation process element, and a depth filter. 
     
     
         7 . The system of  claim 1  wherein said system includes at least two series combinations of a degassing element and a defect reduction processing element and said nanotube application solution is processed through each series combination prior to being processed through said solution deposition element. 
     
     
         8 . The system of  claim 1  wherein said step of degassing element prevents the formation of nanotube clumps as said nanotube application solution is processed through said defect reduction process element and said solution deposition element. 
     
     
         9 . The system of  claim 1  wherein said system is capable of forming a uniform nanotube fabric layer that is substantially free of defects. 
     
     
         10 . The system of  claim 1  wherein said system is capable of forming a uniform nanotube fabric layer that is substantially free of defects having a diameter of greater than about 2 microns. 
     
     
         11 . The system of  claim 1  wherein said system is capable of forming a uniform nanotube fabric layer that is substantially free of defects having a diameter of greater than about 10 microns. 
     
     
         12 . The system of  claim 1  wherein said system is capable of forming a uniform nanotube fabric layer that is substantially free of defects having a diameter of greater than about 20 microns. 
     
     
         13 . The system of  claim 1  further including a nanotube application solution purification element. 
     
     
         14 . The system of  claim 13  wherein said purification element comprises at least one of an acid oxidation process element, a cross-flow filtration process element, an ion exchange process element, and a centrifugation process element. 
     
     
         15 . The system of  claim 1  wherein said system is configured for use within a semiconductor manufacturing process.