US2017271288A1PendingUtilityA1

Multi-chip package and manufacturing method

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Assignee: GE EMBEDDED ELECTRONICS OYPriority: Jul 22, 2008Filed: Jun 2, 2017Published: Sep 21, 2017
Est. expiryJul 22, 2028(~2 yrs left)· nominal 20-yr term from priority
H10W 90/732H10W 90/724H10W 90/22H10W 90/20H10W 72/9413H10W 72/874H10W 72/853H10W 72/073H10W 70/099H10W 90/00H10W 70/614H10W 70/093H10W 70/60H10W 72/90H10D 84/01H10W 20/01H01L 2924/01033H05K 2201/10674H01L 2224/32145H01L 2224/92244H05K 2201/0969H01L 2224/73267H01L 2924/19104H01L 2924/19041H01L 2225/06517H01L 24/09H01L 2924/01074H01L 24/82H01L 24/24H05K 1/188H01L 25/0657H01L 2225/06524H01L 23/5389H01L 2924/01019H01L 2924/30107H01L 2924/01029H01L 2224/04105H01L 2924/19105H01L 2224/24145H01L 25/50H01L 2224/73217H01L 2924/12042H05K 3/305H05K 3/32
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Claims

Abstract

Manufacturing method and a multi-chip package, which comprises a conductor pattern and insulation, and, inside the insulation, a first component, the contact terminals of which face towards the conductor pattern and are conductively connected to the conductor pattern. The multi-chip package also comprises inside the insulation a second semiconductor chip, the contact terminals of which face towards the same conductor pattern and are conductively connected through contact elements to this conductor pattern. The semiconductor chips are located in such a way that the first semiconductor chip is located between the second semiconductor chip and the conductor pattern.

Claims

exact text as granted — not AI-modified
1 . A multi-chip package comprising:
 a conductor pattern;   a first component and a second component both embedded in an insulation such that the first component is located between the conductor pattern and the second component;   the first component and the second component both comprising contact terminals facing towards the conductor pattern; and   contact elements between the contact terminals of the second component and the conductor pattern, the contact elements containing electrochemically grown copper;   wherein the contact terminals of the second component are electrically connected to the conductor pattern over conductor paths each running through one of said contact elements.   
     
     
         2 . The multi-chip package of  claim 1 , wherein the first component is a microprocessor and the second component is a memory. 
     
     
         3 . The multi-chip package of  claim 1 , wherein the contact elements extend between the contact terminals of the second component and the conductor pattern principally only in the thickness direction of the multi-chip package. 
     
     
         4 . The multi-chip package of  claim 1 , wherein the first component is located entirely between the second component and the conductor pattern. 
     
     
         5 . The multi-chip package of  claim 1 , wherein the contact elements are mainly formed of copper. 
     
     
         6 . The multi-chip package of  claim 5 , wherein the contact elements have a height, the height being in the range of 10 to 200 micrometres. 
     
     
         7 . The multi-chip package of  claim 1 , wherein the conductor pattern is in one planar layer in the multi-chip package. 
     
     
         8 . The multi-chip package of  claim 7 , comprising further conductor patterns in further planar layers in the multi-chip package, wherein the conductor patterns are separated from each other by insulator in the thickness direction of the multi-chip package. 
     
     
         9 . A multi-chip package comprising:
 a planar conductor pattern;   a first component embedded in an insulation on the planar conductor pattern, the first component having first contact terminals facing towards the planar conductor pattern and conductively connected to the planar conductor pattern by means of first contact elements; and   a second component embedded in the insulation on the planar conductor pattern such that the first component is located between the second component and the planar conductor pattern, the second component having second contact terminals facing towards the planar conductor pattern and conductively connected to the planar conductor pattern by means of second contact elements, each second contact element comprising a metal core made of electrochemically grown copper.   
     
     
         10 . The multi-chip package of  claim 9 , wherein the first component is a microprocessor and the second component is a memory. 
     
     
         11 . The multi-chip package of  claim 10 , wherein the microprocessor is located entirely between the memory and the planar conductor pattern. 
     
     
         12 . The multi-chip package of  claim 9 , wherein each first contact element comprises at least one layer of electrochemically grown copper. 
     
     
         13 . The multi-chip package of  claim 9 , wherein the second contact elements extend between the contact terminals of the second component and the planar conductor pattern principally only in the thickness direction of the multi-chip package. 
     
     
         14 . The multi-chip package of  claim 13 , wherein the second contact elements have a height in the thickness direction of the multi-chip package, the height being in the range of 10 to 200 micrometres. 
     
     
         15 . The multi-chip package of  claim 9 , wherein at least one first contact terminal is electrically connected to at least one second contact terminal over a conductor path, which conductor path consists of part of the planar conductor pattern as well as one of the first contact elements and one of the second contact elements. 
     
     
         16 . The multi-chip package of  claim 9 , wherein each second contact element is a cylindrical conductor piece. 
     
     
         17 . A multi-chip package comprising:
 a conductor pattern;   a microprocessor and a memory embedded in the multi-chip package such that the microprocessor is located between the conductor pattern and the memory, the microprocessor and the memory both comprising contact terminals facing towards the conductor pattern;   first contact elements between the conductor pattern and the contact terminals of the microprocessor;   second contact elements between the conductor pattern and the contact terminals of the memory, each second contact element made of copper and having a height of 10 to 200 micrometres.   
     
     
         18 . The multi-chip package of  claim 17 , wherein each second contact element has a width of 10 to 200 micrometres. 
     
     
         19 . The multi-chip package of  claim 18 , wherein the second contact elements extend between the conductor pattern and the contact terminals of memory principally only in the thickness direction of the multi-chip package. 
     
     
         20 . The multi-chip package of  claim 17 , wherein the microprocessor is located entirely between the memory and the conductor pattern.

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