Method for improving the coking resistance of a lubricating composition
Abstract
Disclosed is a method of lubrication including a step of lubricating a machine with a lubricating composition, the lubricating composition including 20-100% ionic liquid or of a mixture of several ionic liquids. The ionic liquid or the mixture is selected from at least: an anion A − chosen from sulfonylimides, the substituent(s) of which is (are) independently chosen from a fluoroalkyl, fluoroether, perfluorinated alkyl or perfluoroether group; and a cation C + including a nitrogen-containing heterocycle or a quaternary ammonium, the substituent(s) of which is (are) independently chosen from: a hydrogen atom or alkyl, alkoxy, fluorinated alkyl, perfluorinated alkyl, alkylsilane, alkyl alcohol, vinyl, alkyl allyl, ether or polyether groups having a linear or branched chain having 1-3 carbon atoms. The deposition start temperature in thin film of the ionic liquid or of the mixture of ionic liquids is at least equal to 330° C. The lubricating composition reduces deposits formed in the machine.
Claims
exact text as granted — not AI-modified1 - 14 . (canceled)
15 . Method of lubrication which comprises a step of lubricating a machine with a lubricating composition, the lubricating composition comprising, in mass with respect to the total mass of said lubricating composition, from 20% to 100% of an ionic liquid or of a mixture of several ionic liquids,
wherein said ionic liquid or said mixture of ionic liquids is selected from an ionic liquid or a mixture of ionic liquids comprising at least: an anion A − chosen from sulfonylimides, the substituent(s) of which is (are) independently chosen from a fluoroalkyl, fluoroether, perfluorinated alkyl or perfluoroether group, and a cation C + comprising a nitrogen-containing heterocycle or a quaternary ammonium, the substituent(s) of which is (are) independently chosen from: a hydrogen atom or alkyl, alkoxy, fluorinated alkyl, perfluorinated alkyl, alkylsilane, alkyl alcohol, vinyl, alkyl allyl, ether or polyether groups having a linear or branched chain having from 1 to 3 carbon atoms, on condition that when the cation is a quaternary ammonium, at least two of these substituents are a methyl group, the deposition start temperature (TDD) in thin film, determined by the MCT method according to the standard GFC Lu-27 A-13, of the ionic liquid or of the mixture of ionic liquids being at least equal to 330° C., said lubricating composition being suitable to reduce the deposits formed in said machine.
16 . Method according to claim 15 , in which the lubricating step is carried out at high temperatures of between 200 and 500° C.
17 . Method according to claim 15 , in which said cation C + comprising a nitrogen-containing heterocycle is selected among: imidazolium, pyrazolium, quinolium, pyridinium, piperidinium, oxazolium, thiazolium, benzothiazolium or morpholinium.
18 . Method according to claim 15 , in which the cation C + comprising a nitrogen-containing heterocycle is selected among: imidazolium, pyridinium, or pyrazolium.
19 . Method according to claim 15 , in which the deposition start temperature (TDD) in thin film, determined by the method MCT according to the standard GFC Lu-27 A-13, of said ionic liquid or of said mixture of ionic liquids is at least equal to 350° C.
20 . Method according to claim 17 , in which the cation C + is imidazolium comprising at least two methyl groups at position 1 and 2 or at position 2 and 3, or a pyridinium comprising at least one methyl group.
21 . Method according to claim 20 , in which the cation C + is a pyridinium comprising at least one methyl group at position 3, 4 or 5.
22 . Method according to claim 20 , in which the imidazolium comprising a methyl group at position 1 and 2 or at position 2 and 3 comprises a hydrogen atom at position 4 and 5.
23 . Method according to claim 22 , in which the imidazolium cation C + is 1-ethyl-2,3-dimethylimidazolium or 1,2-dimethyl-3-((trimethylsilyl)methyl)imidazolium.
24 . Method according to claim 22 , in which the imidazolium, whose substituents in position 1 and 2 are methyls, the substituents in position 4 and 5 are hydrogen atoms, comprises a substituent in position 3 independently selected among the alkyl, fluorinated alkyl, perfluorinated alkyl, alkyl silane, alkyl alcohol or vinyl groups having a linear chain or a branched chain with 1 to 3 carbon atoms.
25 . Method according to claim 15 , in which said
sulfonylimide corresponds to the following general formula:
in which R 1 and R 2 are identical or different and independently selected among a fluoroalkyl, fluoroether, perfluorinated alkyl or perfluoroether group, such as [(CF 3 SO 2 ) 2 N] − , [(CF 3 CF 2 SO 2 ) 2 N] − , [(CF 3 CF 2 CF 2 CF 2 SO 2 ) 2 N] − or [(CF 3 CF 2 CF 2 SO 2 ) 2 N] − .
26 . Method according to claim 25 , in which said sulfonylimide corresponds to [(CF 3 SO 2 ) 2 N] − , [(CF 3 CF 2 SO 2 ) 2 N] − , [(CF 3 CF 2 CF 2 CF 2 SO 2 ) 2 N] − or [(CF 3 CF 2 CF 2 SO 2 ) 2 N] − .
27 . Method according to claim 15 , in which the ionic liquid or at least one of the ionic liquids of the mixture is selected among:
3-(2-hydroxyethyl)-2,3-dimethylimidazolium bis(trifluoromethylsulfonyl)imide; 3-(2-hydroxypropyl)-2,3-dimethylimidazolium bis(trifluoromethylsulfonyl)imide; 1-ethyl-2,3-dimethylimidazolium bis(trifluoromethylsulfonyl)imide; 1-ethyl-2,3-dimethylimidazolium bis(pentafluoroethylsulfony)imide; 3-allyl-1,2-dimethylimidazolium bis(trifluoromethylsulfonyl)imide; 1,2-dimethyl-3-(trimethylsilyl)methyl)imidazolium bis(pentafluoroethylsulfony)imide; 1,2-dimethyl-3-((trimethylsilyl)methyl)imidazolium bis(trifluoromethylsulfonyl)imide; 1,2-dimethyl-3-((trimethylsilyl)propyl)imidazolium bis(trifluoromethylsulfonyl)imide; 2,3-dimethyl-1-propylimidazolium bis(pentafluoroethylsulfony)imide 2,3-dimethyl-1-propylimidazolium bis(trifluoromethylsulfonyl)imide; 2,3-dimethyl-1-propylimidazolium 1,1,2,2,3,3-hexafluoropropane-1,3-disulfonylimide; 3-(2-methoxyethyl)-1,2-dimethylimidazolium bis(pentafluoroethylsulfony)imide; 3-(2-methoxyethyl)-1,2-dimethylimidazolium bis(trifluoromethylsulfonyl)imide; 2,3-dimethyl-1-propanolimidazolium bis(trifluoromethylsulfonyl)imide; 1,2 dimethyl-3-allylimidazolium bis(trifluoroethylsulfonyl)imide; 1-propyl-3,5-dimethylpyridinium bis(trifluoromethyl)sulfonyl)imide; 1-(2-hydroxyethyl)-3,5-dimethylpyridinium bis(trifluoromethyl)sulfonyl)imide; ethyldimethylpropylammonium bis(trifluoromethylsulfonyl)imide; N-ethyl-2-hydroxy-N,N-dimethylethaneammonium bis(trifluoromethylsulfonyl)imide; N-ethyl-2-hydroxy-N,N-dimethylethaneammonium bis(pentafluoroethylsulfonyl) imide; N-(2-hydroxyethyl)-N,N-dimethylpropaneammonium bis(trifluoromethylsulfonyl) imide; 1-propyl-4-methylpyridin-1-ium bis(trifluoromethylsulfonyl)imide; 1-ethyl-3-methylpyridin-1-ium bis(trifluoromethylsulfonyl)imide; 1-propyl-3,5-dimethylpyridinium bis(trifluoromethylsulfonyl)imide; 1-(2-hydroxyethyl)-3,5-dimethylpyridinium bis(trifluoromethylsulfonyl)imide; or a mixture thereof.
28 . Method according to claim 15 , in which the lubricating composition comprises at least 50% to 100% of said ionic liquid with respect to the total mass of the lubricating composition.
29 . Method according to claim 28 , in which the lubricating composition comprises at 75 mass-% to 100 of said ionic liquids with respect to the total mass of the lubricating composition.
30 . Method according to claim 15 , in which the lubricating composition comprises from 0 mass-% to 25 mass-% of one or of several additives with respect to the total mass of the lubricating composition.
31 . Method according to claim 30 , in which the additive or the additives are selected from: anti-wear agents, anti-corrosion agents, antioxidants, and a mixture of two or more of these additives.
32 . Method for reducing the deposits formed in a machine by using a lubricating composition, in which said lubricating composition comprises, by mass with respect to its total mass, from 20% to 100% of an ionic liquid or of a mixture of several ionic liquids,
said ionic liquid or said mixture of ionic liquids being selected from an ionic liquid or a mixture of ionic liquids comprising at least: an anion A− chosen from sulfonylimides, the substituent(s) of which is (are) independently chosen from a fluoroalkyl, fluoroether, perfluorinated alkyl, perfluoroether or perfluorosulfonyl group, and a cation C+ comprising a nitrogen-containing heterocycle or a quaternary ammonium, the substituent(s) of which is (are) independently chosen from: a hydrogen atom or alkyl, alkoxy, fluorinated alkyl, perfluorinated alkyl, alkylsilane, alkyl alcohol, vinyl, alkyl allyl, ether or polyether groups having a linear or branched chain having from 1 to 3 carbon atoms, on condition that when the cation is a quaternary ammonium, at least two of these substituents are a methyl group, the deposition start temperature (TDD) in thin film, determined by the MCT method according to the standard GFC Lu-27 A-13, of the ionic liquid or of the mixture of ionic liquids is at least equal to 330° C.
33 . Method according to claim 32 , wherein the deposition start temperature (TDD) in thin film, determined by the MCT method according to the standard GFC Lu-27 A-13, of the ionic liquid or of the mixture of ionic liquids is higher than or equal to 350° C.
34 . The method of claim 20 , wherein the cation C + is a pyridinium comprising at least one methyl group at position 3, 4 or 5.Cited by (0)
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