US2017333091A1PendingUtilityA1

Spinous process implants and associated methods

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Assignee: ZIMMER BIOMET SPINE INCPriority: Jan 11, 2007Filed: Jul 21, 2017Published: Nov 23, 2017
Est. expiryJan 11, 2027(~0.5 yrs left)· nominal 20-yr term from priority
A61B 17/7061A61B 17/7071A61B 17/7068A61B 2017/00477A61B 17/7053A61B 17/842A61F 2/44
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Claims

Abstract

The present invention provides spinous process implant and associated methods. In one aspect of the invention the implant limits the maximum spacing between the spinous processes. In another aspect of the invention, a spacer has at least one transverse opening to facilitate tissue in-growth. In another aspect of the invention, an implant includes a spacer and separate extensions engageable with the spacer. In another aspect of the invention, instrumentation for inserting the implant is provided. In other aspects of the invention, methods for treating spine disease are provided.

Claims

exact text as granted — not AI-modified
1 . (canceled) 
     
     
         2 . An implant for placement between spinous processes of adjacent vertebrae of a spine, the implant comprising:
 a first half configured to abut a first side of the adjacent vertebrae, the first half including a first extension, the first extension including a first end to abut a first side of a first spinous process on a first vertebra of the adjacent vertebrae and a second end to abut a first side of a second spinous process on a second vertebra of the adjacent vertebrae;   a second half configured to abut a second side of the adjacent vertebrae, the second half including a second extension, the second extension including a first end to abut a second side of the first spinous process on the first vertebra and a second end to abut a second side of the second spinous process on the second vertebra;   a spacer configured to be positioned between the spinous processes of the adjacent vertebrae, the spacer including a superior portion and an inferior portion each coupled to at least one of the first half and the second half; and   an adjustment mechanism including a superior-inferior adjustment structure and a locking mechanism.   
     
     
         3 . The implant of  claim 2 , wherein the superior portion of the spacer is fixed to the first half. 
     
     
         4 . The implant of  claim 3 , wherein the inferior portion of the spacer is fixed to the second half. 
     
     
         5 . The implant of  claim 2 , wherein the superior portion of the spacer includes a medial-lateral slot that cooperates with the adjustment mechanism to enable medial-lateral adjustment of the first half relative to the second half 
     
     
         6 . The implant of  claim 5 , wherein the adjustment mechanism includes a superior-inferior slot to enable adjustment of superior-inferior spacing between the superior portion and inferior portion of the spacer. 
     
     
         7 . The implant of  claim 6 , wherein the superior-inferior slot is formed in a body portion of the second extension. 
     
     
         8 . The implant of  claim 6 , wherein the locking mechanism includes a fastener, wherein the fastener extends through the medial-lateral slot and the superior-inferior slot. 
     
     
         9 . The implant of  claim 2 , wherein the locking mechanism includes a fastener, and wherein at least a portion of the fastener extends through at least a portion of one of the first half and the second half and at least a portion of the spacer. 
     
     
         10 . An implant for placement between spinous processes of adjacent vertebrae of a spine, the implant comprising:
 a first half configured to abut a first side of the adjacent vertebrae, the first half including a first extension, the first extension including a first end to abut a first side of a first spinous process on a first vertebra of the adjacent vertebrae and a second end to abut a first side of a second spinous process on a second vertebra of the adjacent vertebrae;   a second half configured to abut a second side of the adjacent vertebrae, the second half including a second extension, the second extension including a first end to abut a second side of the first spinous process on the first vertebra and a second end to abut a second side of the second spinous process on the second vertebra;   a spacer configured to be positioned between the spinous processes of the adjacent vertebrae, the spacer including a superior portion coupled to the first half and an inferior portion coupled to the second half; and   an adjustment mechanism including a superior-inferior adjustment structure, a medial-lateral adjustment structure, and a locking mechanism.   
     
     
         11 . The implant of  claim 10 , wherein the medial-lateral adjustment structure is a medial-lateral slot in the superior portion of the spacer. 
     
     
         12 . The implant of  claim 11 , wherein the superior-inferior adjustment structure is a superior-inferior slot in the second extension. 
     
     
         13 . The implant of  claim 12 , wherein the locking mechanism is a bolt and a nut, wherein the bolt extends through the medial-lateral slot and the superior-inferior slot to enable medial-lateral adjustment of the first half relative to the second half and superior-inferior adjustment of the superior portion relative to the inferior portion. 
     
     
         14 . The implant of  claim 10 , wherein at least one of the first extension and the second extension include spikes on the second end. 
     
     
         15 . The implant of  claim 14 , wherein the at least one of the first extension and the second extension include spikes on the first end. 
     
     
         16 . The implant of  claim 15 , wherein the second extension includes a smooth first end and a smooth second end to ease height adjustment. 
     
     
         17 . The implant of  claim 10 , wherein the second end of the first extension includes angled spikes to engage the second vertebra having a small or missing spinous process. 
     
     
         18 . A spinal fusion device for placement between spinous processes of adjacent vertebrae of a spine, the implant comprising:
 a first half configured to abut a first side of the adjacent vertebrae, the first half including a first extension and a superior portion of a spacer, the first extension including a first end to abut a first side of a first spinous process on a first vertebra of the adjacent vertebrae and a second end to abut a first side of a second spinous process on a second vertebra of the adjacent vertebrae, and the spacer configured to be positioned between spinous processes of the adjacent vertebrae;   a second half configured to abut a second side of the adjacent vertebrae, the second half including a second extension and an inferior portion of the spacer, the second extension including a first end to abut a second side of the first spinous process on the first vertebra and a second end to abut a second side of the second spinous process on the second vertebra; and   an adjustment mechanism including a superior-inferior adjustment structure, a medial-lateral adjustment structure, and a locking mechanism.   
     
     
         19 . The spinal fusion device of  claim 18 , wherein the superior portion of the spacer includes a medial-lateral slot that forms the medial-lateral adjustment structure and that cooperates with the locking mechansim to enable medial-lateral adjustment of the first half relative to the second half. 
     
     
         20 . The spinal fusion device of  claim 19 , wherein the adjustment mechanism includes a superior-inferior slot formed in a body portion of the second extension to enable adjustment of superior-inferior spacing between the superior portion and inferior portion of the spacer. 
     
     
         21 . The spinal fusion device of  claim 20 , wherein the locking mechanism includes a bolt and a nut, wherein the bolt extends through the medial-lateral slot and the superior-inferior slot to lock the first half in a position relative to the second half.

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