US2017350009A1PendingUtilityA1

Gas barrier film and method of manufacturing the same

Assignee: TOPPAN PRINTING CO LTDPriority: Feb 26, 2015Filed: Aug 23, 2017Published: Dec 7, 2017
Est. expiryFeb 26, 2035(~8.6 yrs left)· nominal 20-yr term from priority
Inventors:Nao Takashima
B32B 37/144B32B 2307/422C08J 2367/02B32B 2307/7242B32B 27/08B05D 1/60B05D 7/04C23C 16/45525B32B 2457/206C08J 7/08C23C 16/403B32B 38/18C23C 16/45536C23C 16/405B32B 2037/246C23C 16/45523B32B 9/00B32B 37/24C23C 16/545B32B 2038/0076
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Claims

Abstract

A method of manufacturing a gas barrier film includes depositing an atomic layer deposition film on a surface of a plastic substrate to form a gas barrier laminate, using atomic layer deposition; depositing a curable resin layer on a support from which the layer is peelable, to form an overcoat laminate; laminating the overcoat laminate to the gas barrier laminate, with the atomic layer deposition film and the curable resin layer facing each other, and transferring the curable resin layer onto the atomic layer deposition film; curing the curable resin layer through application of heat or an active energy beam; and releasing the curable resin layer from the support.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A method of manufacturing a gas barrier film, comprising:
 depositing an atomic layer deposition film on a surface of a plastic substrate to form a gas barrier laminate, using atomic layer deposition;   depositing a curable resin layer on a support from which the curable resin layer is peelable, to form an overcoat laminate;   laminating the overcoat laminate to the gas barrier laminate, with the atomic layer deposition film and the curable resin layer facing each other, and transferring the curable resin layer onto the atomic layer deposition film;   curing the curable resin layer through application of heat or an active energy beam; and   releasing the curable resin layer from the support.   
     
     
         2 . The method of manufacturing a gas barrier film of  claim 1 , wherein the relationship 10 t a <t oc <200 t a  is satisfied, where t a  is the thickness of the atomic layer deposition film, and t oc  is the thickness of the curable resin layer. 
     
     
         3 . The method of manufacturing a gas barrier film of  claim 1 , wherein the curable resin layer is released from the support before the curable resin layer is cured. 
     
     
         4 . The method of manufacturing a gas barrier film of  claim 1 , wherein the curable resin layer has a Martens hardness of 50 N/mm 2  or less. 
     
     
         5 . The method of manufacturing a gas barrier film of  claim 1 , wherein the curable resin layer has a Martens hardness of 100 N/mm 2  or more to 300 N/mm 2  or less after being cured. 
     
     
         6 . The method of manufacturing a gas barrier film of  claim 1 , wherein the gas barrier laminate and the overcoat laminate are in a web/rolled state where they can be unwound continuously. 
     
     
         7 . A gas barrier film comprising:
 a plastic substrate;   an atomic layer deposition film deposited on a surface of the plastic substrate by atomic layer deposition; and   an overcoat layer formed on a surface of the atomic layer deposition film and formed of a cured curable resin layer, wherein the overcoat layer has a Martens hardness of 100 N/mm 2  or more to 300 N/mm 2  or less.

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