Polishing pad, polishing apparatus and method for manufacturing polishing pad

Abstract

The present invention relates to a polishing pad with improved slurry retention capacity, which includes a polishing layer. The polishing layer includes an elastomer main body and a plurality of titanium dioxide nanowires. Each of the titanium dioxide nanowires is independent and is distributed evenly and randomly in the elastomer main body. The present invention further provides a polishing apparatus and a method for manufacturing the polishing pad.

What is claimed is: 
     
         1 . A polishing pad comprising:
 a polishing layer, wherein the polishing layer comprises
 an elastomer main body; and 
 a plurality of titanium dioxide nanowires, wherein each of the titanium dioxide nanowires is independent and is dispersed evenly and randomly in the elastomer main body. 
   
     
     
         2 . The polishing pad according to  claim 1 , wherein the polishing layer further comprises a plurality of pores dispersed in the elastomer main body. 
     
     
         3 . The polishing pad according to  claim 1 , wherein the polishing layer further comprises a nonwoven fabric. 
     
     
         4 . The polishing pad according to  claim 1 , wherein a length of the plurality of titanium dioxide nanowires is about 0.1 nm to about 100 nm. 
     
     
         5 . The polishing pad according to  claim 1 , wherein a diameter of the plurality of titanium dioxide nanowires is about 0.1 nm to about 50 nm. 
     
     
         6 . The polishing pad according to  claim 1 , wherein a ratio of the plurality of titanium dioxide nanowires in the polishing layer is about 0.1% to about 20% by weight. 
     
     
         7 . The polishing pad according to  claim 1 , wherein a portion of the plurality of titanium dioxide nanowires is exposed on a surface of the polishing layer. 
     
     
         8 . The polishing pad according to  claim 2 , wherein a portion of the plurality of titanium dioxide nanowires is disposed in the plurality of pores. 
     
     
         9 . The polishing pad according to  claim 1 , wherein the polishing layer further comprises a plurality of polishing particles evenly distributed in the elastomer main body. 
     
     
         10 . The polishing pad according to  claim 1 , further comprising a buffer layer on a surface of the polishing layer. 
     
     
         11 . The polishing pad according to  claim 10 , further comprising a binder layer binding the polishing layer and the buffer layer. 
     
     
         12 . The polishing pad according to  claim 1 , wherein the polishing layer further comprises a polishing surface, and wherein the polishing surface comprises a groove. 
     
     
         13 . The polishing pad according to  claim 1 , further comprising an adhesive layer on a surface of the polishing layer. 
     
     
         14 . A polishing apparatus comprising:
 a polishing plate;   a substrate;   the polishing pad according to  claim 1 , which is adhered on the polishing plate for polishing the substrate; and   slurry contacting with the substrate for polishing.   
     
     
         15 . A method for manufacturing the polishing pad according to  claim 1 , comprising:
 (a) providing an elastomer composition;   (b) providing the plurality of titanium dioxide nanowires;   (c) dispersing the titanium dioxide nanowires of the step (b) evenly and randomly in the elastomer composition of the step (a);   (d) providing the polishing layer by curing the elastomer composition to form the elastomer main body.   
     
     
         16 . The method according to  claim 15 , further comprising coating the elastomer composition randomly dispersed with the plurality of titanium dioxide nanowires of the step (c) on a carrier before the step (d), wherein the carrier is a release liner. 
     
     
         17 . The method according to  claim 16 , wherein the carrier comprises a polyethylene glycol terephthalate film, a polypropylene film, a polycarbonate film, a polyethylene film, a polyethylene terephthalate film, a release paper or a release fabric. 
     
     
         18 . The method according to  claim 19 , wherein the carrier is continuously provided. 
     
     
         19 . The method according to  claim 15 , further comprising filling the elastomer composition randomly dispersed with the plurality of titanium dioxide nanowires of the step (c) in a cavity of a mold before the step (d). 
     
     
         20 . The method according to  claim 15 , further comprising immersing a nonwoven fabric in the elastomer composition randomly dispersed with the plurality of titanium dioxide nanowires of the step (c) before the step (d).