US2018052390A1PendingUtilityA1

Onium compounds and methods of synthesis thereof

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Assignee: ROHM & HAAS ELECT MATPriority: Sep 15, 2012Filed: Jul 10, 2017Published: Feb 22, 2018
Est. expirySep 15, 2032(~6.2 yrs left)· nominal 20-yr term from priority
G03F 7/162G03F 7/0382G03F 7/039G03F 7/2004G03F 7/004C07D 335/16C07C 309/12C07C 2603/74G03F 7/0392G03F 7/0045C07C 303/32G03F 7/029G03F 7/0397G03F 7/168G03F 7/20G03F 7/0046G03F 7/322G03F 7/38C08K 5/45G03F 7/00G03F 7/2002
54
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Claims

Abstract

New onium salt compounds and methods for synthesis of such compounds are provided. Preferred methods of the invention include (a) providing an onium salt compound comprising a sulfonate component having an electron withdrawing group; and (b) treating the onium salt compound with a halide salt to form a distinct salt of the onium compound. The present onium compounds are useful as an acid generator component of a photoresist composition.

Claims

exact text as granted — not AI-modified
1 - 6 . (canceled) 
     
     
         7 . A method of preparing a photoresist composition, comprising admixing a treated onium compound with a polymer to provide a photoresist composition,
 wherein the treated onium compound is obtainable by steps comprising:   (a) providing an onium salt compound comprising a sulfonate component, wherein the sulfonate component comprises an electron withdrawing group; and   (b) treating the onium salt compound with a halide salt to form the treated onium compound that is a distinct salt of the onium salt compound.   
     
     
         8 . A photolithographic method comprising: (i) applying a coating layer of a photoresist composition prepared in accordance with  claim 7  on a substrate surface; (ii) exposing the photoresist composition to activating radiation; and (iii) developing the exposed photoresist composition layer to provide a resist relief image. 
     
     
         9 . An onium salt compound, obtainable by a method comprising:
 (a) providing an onium salt comprising a sulfonate component, wherein the sulfonate component comprises an electron withdrawing group;   (b) treating the sulfonate salt with a halide salt to form a halide salt of the onium compound; and   (c) treating the halide salt of the onium compound to form a distinct salt of the onium compound.   
     
     
         10 . A photoresist comprising a polymer and an onium salt compound of  claim 9 . 
     
     
         11 . The method of  claim 7  wherein the wherein the treated onium compound is obtained by the steps.

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