Semiconductor device

Abstract

A semiconductor device may be provided. The semiconductor device may include conductive patterns surrounding a channel film. The conductive patterns may be stacked and spaced apart from one another. The semiconductor device may include a gate contact plug coupled to one of the conductive patterns. The semiconductor device may include support pillars penetrating the conductive patterns in a periphery of the gate contact plug.

What is claimed is: 
     
         1 . A semiconductor device, comprising:
 conductive patterns surrounding a channel film, the conductive patterns stacked and spaced apart from one another;   a gate contact plug coupled to one of the conductive patterns;   a first trench buried film extending in a first direction and penetrating the conductive patterns;   a second trench buried film extending in the first direction, facing the first trench buried film, and penetrating the conductive patterns;   a first support pillar and a second support pillar facing each other in a second direction intersecting the first direction; and   a third support pillar disposed between the gate contact plug and the first trench buried film,   wherein the third support pillar has a greater width in the second direction than the first and second support pillar.   
     
     
         2 . The semiconductor device of  claim 1 , wherein the first and second support pillars each have a bar type shape extending from one end adjacent to the first trench buried film to the second trench buried film. 
     
     
         3 . The semiconductor device of  claim 1 , wherein the first, second, and third support pillars are all spaced apart from one another. 
     
     
         4 . The semiconductor device of  claim 1 , wherein the first support pillar, the second support pillar, the third support pillar and the gate contact plug are disposed between the first trench buried film and the second trench buried film. 
     
     
         5 . The semiconductor device of  claim 1 , wherein the third support pillar is disposed between the first support pillar and the second support pillar.