Pixel structure

Abstract

A pixel structure includes a pixel electrode, a data selection line and an isolation line. The isolation line is disposed along the pixel electrode. The pixel electrode is configured to store a pixel voltage. The data selection line is configured to transmit a data signal. The isolation line is configured to reduce an influence of an electric field of the data signal on the pixel voltage of the pixel electrode. A projection area of the isolation line is overlapped with a projection area of the pixel electrode.

What is claimed is: 
     
         1 . A pixel structure, comprising:
 a pixel electrode configured to store a pixel voltage;   a data selection line configured to transmit a data signal; and   an isolation line disposed along the pixel electrode and configured to reduce an influence of an electric field of the data signal on the pixel voltage of the pixel electrode, wherein a projection area of the isolation line is overlapped with a projection area of the pixel electrode.   
     
     
         2 . The pixel structure of  claim 1 , wherein the pixel electrode comprises:
 a first electrode; and   a second electrode electrically coupled to the first electrode, wherein a projection area of the isolation line is overlapped with a projection area of the second electrode.   
     
     
         3 . The pixel structure of  claim 1 , wherein the isolation line and the data selection line are disposed on a same layer. 
     
     
         4 . The pixel structure of  claim 1 , wherein the isolation line is disposed between the pixel electrode and the data selection line. 
     
     
         5 . The pixel structure of  claim 1 , wherein the isolation line is spaced from the pixel electrode at a first distance, and the first distance is not greater than a distance between the pixel electrode and the data selection line. 
     
     
         6 . The pixel structure of  claim 5 , wherein the first distance is in a range from 3 μm to 7 μm. 
     
     
         7 . The pixel structure of  claim 1 , wherein the isolation line is spaced from the data selection line at a second distance, and the second distance is smaller than a distance between the pixel electrode and the data selection line. 
     
     
         8 . The pixel structure of  claim 7 , wherein the second distance is in a range from 3 μm to 7 μm. 
     
     
         9 . The pixel structure of  claim 1 , wherein the isolation line is electrically coupled to a fixed voltage. 
     
     
         10 . The pixel structure of  claim 1 , wherein the isolation line is electrically coupled to a ground terminal.