Substrate comprising a stack having thermal properties

Abstract

The invention relates to a substrate ( 10 ), especially a transparent glass substrate, provided with a thin-film multilayer comprising a functional layer ( 40 ) having reflection properties in the infrared and/or in solar radiation, especially a metallic functional layer based on silver or on a metal alloy containing silver, and two coatings ( 20, 60 ), said coatings being composed of a plurality of dielectric layers ( 24, 26; 64 ), so that the functional layer ( 40 ) is placed between the two coatings ( 20, 60 ), the functional layer ( 40 ) being deposited on a wetting layer ( 30 ) itself deposited directly onto a subjacent coating ( 20 ), characterized in that the subjacent coating ( 20 ) comprises at least one dielectric layer ( 24 ) based on nitride, especially on silicon nitride and/or aluminum nitride, and at least one noncrystalline smoothing layer ( 26 ) made from a mixed oxide, said smoothing layer ( 26 ) being in contact with said superjacent wetting layer ( 30 ).

1 . A substrate provided with a thin-film multilayer comprising, in the following order from the substrate:
 a subjacent coating comprising a plurality of dielectric layers comprising:
 a dielectric layer based on a nitride; and 
 a noncrystalline smoothing layer based on a mixed oxide; 
   a wetting layer;   a functional layer having reflection properties in the infrared and/or in solar radiation; and   a second coating comprising a plurality of dielectric layers   wherein the smoothing layer is in contact with the wetting layer.   
     
     
         2 . The substrate of  claim 1 , wherein the smoothing layer is a mixed oxide layer based on an oxide of at least one metal selected from the group consisting of Sn, Si, Ti, Zr, Hf, Zn, Ga, and In. 
     
     
         3 . The substrate of  claim 2 , wherein the smoothing layer is a layer of a mixed oxide based on zinc and tin, optionally doped, or a layer of a mixed indium tin oxide (ITO) deposited at low temperature. 
     
     
         4 . The substrate of  claim 1 , wherein the smoothing layer is an oxide layer having a nonstoichiometric amount of oxygen. 
     
     
         5 . The substrate of  claim 1 , wherein the smoothing layer has a geometric thickness between 0.1 and 30 nm. 
     
     
         6 . The substrate of  claim 1 , wherein the smoothing layer has a geometric thickness between 0.2 and 10 nm. 
     
     
         7 . The substrate of  claim 1 , wherein the thin film multilayer further comprises a subjacent blocking coating, wherein the functional layer is placed directly onto the subjacent blocking coating. 
     
     
         8 . The substrate of  claim 1 , wherein the thin film multilayer further comprises a superjacent blocking coating, wherein the functional layer is placed directly under the superjacent blocking coating. 
     
     
         9 . The substrate of  claim 1 , wherein the thin film multilayer further comprises a subjacent blocking coating and a superjacent blocking coating, wherein the functional layer is placed directly onto the subjacent blocking coating and directly under the superjacent blocking coating. 
     
     
         10 . The substrate of  claim 7 , wherein the subjacent blocking coating is based on Ni or Ti. 
     
     
         11 . The substrate of  claim 7 , wherein the subjacent blocking coating is based on a Ni alloy. 
     
     
         12 . The substrate of  claim 8 , wherein the superjacent blocking coating is based on Ni or Ti. 
     
     
         13 . The substrate of  claim 8 , wherein the subjacent blocking coating is based on a Ni alloy. 
     
     
         14 . The substrate of  claim 1 , wherein the wetting layer is based on zinc oxide. 
     
     
         15 . The substrate of  claim 1 , wherein dielectric layer based on a nitride in the subjacent coating is based on silicon nitride and/or aluminum nitride. 
     
     
         16 . The substrate of  claim 1 , wherein the functional layer is a metallic functional layer based on silver or on a metal alloy comprising silver. 
     
     
         17 . A glazing unit, comprising:
 the substrate of  claim 1 ; and   optionally, at least one other substrate.   
     
     
         18 . The glazing unit of  claim 17 , mounted in monolithic form or as multiple glazing of a double glazing or laminated glazing type, wherein at least the substrate carrying the multilayer is curved or toughened. 
     
     
         19 . A process for manufacturing the substrate of  claim 1 , the process comprising:
 depositing the thin film multilayer on the substrate by a vacuum sputtering technique, optionally magnetron sputtering; and then   carrying out a heat treatment of bending, toughening or annealing on the substrate without degrading its optical and/or mechanical quality.