Method for fabricating touch display substrate and touch display substrate

Abstract

A method for fabricating a touch display substrate and a touch display substrate are provided to solve the problem that existing touch electrodes of the micron-scale line width cannot meet the high PPI requirement. The fabrication method includes: forming functional layers of an organic light-emitting diode (OLED) device on a base substrate sequentially to obtain an OLED substrate; and forming a linear touch electrode with a nano-scale line width on the OLED substrate by electronic sputtering and transferring.

1 . A method for fabricating a touch display substrate, comprising:
 forming functional layers of an organic light-emitting diode (OLED) device on a base substrate sequentially to obtain an OLED substrate; and   forming a linear touch electrode with a nano-scale line width on the OLED substrate by electronic sputtering and transferring.   
     
     
         2 . The method according to  claim 1 , wherein the forming a linear touch electrode with a nano-scale line width on the OLED substrate by electronic sputtering and transferring comprises:
 sputtering a metal conductive material on a carrier having a pattern of a nano-scale metal line by electronic sputtering, to form a metal conductive material line with a nano-scale line width on the metal line; and   transferring the metal conductive material line with the nano-scale line width formed on the metal line onto the OLED substrate by transferring, to form the linear touch electrode with the nano-scale line width on the OLED substrate.   
     
     
         3 . The method according to  claim 2 , wherein the carrier having the pattern of the nano-scale metal line is formed by:
 forming a nano-scale metal line on a body of the carrier using an electronic beam lithography.   
     
     
         4 . The method according to  claim 2 , further comprising, before the transferring the metal conductive material line with the nano-scale line width formed on the metal line onto the OLED substrate by transferring:
 performing an alignment operation on the OLED substrate and the metal conductive material line with the nano-scale line width formed on the carrier.   
     
     
         5 . The method according to  claim 4 , wherein the alignment operation comprises a rough alignment operation and a fine alignment operation,
 the rough alignment operation comprises aligning the metal conductive material line with the nano-scale line width with a display region of the OLED substrate, and   the fine alignment operation comprises aligning the metal conductive material line with the nano-scale line width with a non-opening zone in the display region.   
     
     
         6 . The method according to  claim 2 , wherein the transferring the metal conductive material line with the nano-scale line width formed on the metal line onto the OLED substrate comprises:
 enabling the metal conductive material line with the nano-scale line width to contact the OLED substrate under a preset condition, to separate the metal conductive material line with the nano-scale line width from the metal line of the carrier, and transfer the metal conductive material line with the nano-scale line width onto the OLED substrate.   
     
     
         7 . The method according to  claim 6 , wherein the preset condition comprises at least one of:
 applying an external force, applying a voltage, illuminating, and heating.   
     
     
         8 . A touch display substrate, comprising: a base substrate, an OLED device arranged on the base substrate, and a linear touch electrode with a nano-scale line width arranged on the OLED device,
 wherein the touch electrode is arranged in a display region of the touch display substrate.   
     
     
         9 . The touch display substrate according to  claim 8 , wherein the line width of the touch electrode is less than or equal to 190 nm. 
     
     
         10 . The touch display substrate according to  claim 8 , wherein the OLED device comprises: an organic light-emitting layer, and
 an orthographic projection of the touch electrode on the base substrate partially overlaps with an orthographic projection of a pattern of the organic light-emitting layer on the base substrate, or the touch electrode is arranged in a non-opening zone in the display region.   
     
     
         11 . The touch display substrate according to  claim 8 , wherein the touch electrode has a single-layer self-capacitance structure, a single-layer mutual-capacitance structure, or a double-layer mutual-capacitance structure. 
     
     
         12 . The touch display substrate according to  claim 8 , wherein the touch electrode is a fingerprint electrode. 
     
     
         13 . The touch display substrate according to  claim 8 , wherein the touch electrode is made of a transparent material. 
     
     
         14 . The touch display substrate according to  claim 13 , wherein the touch electrode is made of at least one of:
 carbon nanotube conductive particles, nano silver, and graphene.   
     
     
         15 . The touch display substrate according to  claim 8 , wherein the touch display substrate is an in-cell touch display substrate, or an on-cell touch display substrate.