US2018240962A1PendingUtilityA1
Pbnzt ferroelectric film, sol-gel solution, film forming method and method for producing ferroelectric film
Est. expiryJan 21, 2030(~3.5 yrs left)· nominal 20-yr term from priority
H10P 14/69398H10P 14/6342H01L 41/187C01G 23/003C23C 18/1225C23C 18/1254H01L 41/39C23C 18/1216H01L 21/02282C01G 33/006C23C 18/1295H01L 21/02197H10N 30/853H10N 30/093
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Claims
Abstract
To provide a PBNZT ferroelectric film capable of preventing sufficiently oxygen ion deficiency. The PBNZT ferroelectric film according to an embodiment of the present invention is a ferroelectric film including a perovskite-structured ferroelectric substance represented by ABO3, wherein the perovskite-structured ferroelectric substance is a PZT-based ferroelectric substance containing Pb2+ as A-site ions and containing Zr4+ and Ti4+ as B-site ions, and the A-site contains Bi3+ as A-site compensation ions and the B-site contains Nb5+ as B-site compensation ions.
Claims
exact text as granted — not AI-modified1 . A method for producing a ferroelectric film comprising the steps of:
preparing a sol-gel solution including a raw material solution including: a hydrolysis condensation polymerization of an alkoxide raw material including Pb, Bi, Nb, Zr and Ti and heteropolyacid; and polar solvents and unsaturated fatty acids; coating said sol-gel solution on a substrate to form a coated film on said substrate; subjecting said coated film to temporary burning at a temperature of 25 to 450° C. to form a ferroelectric material film on said substrate; and heat-treating said ferroelectric material film at a temperature of 450 to 800° C. to produce a ferroelectric film including a perovskite-structured ferroelectric substance obtained by crystallizing said ferroelectric material film.
2 . The method for producing a ferroelectric film according to claim 1 , wherein said ferroelectric film is a PBNZT ferroelectric film comprising a perovskite-structured ferroelectric substance represented by (Pb 1-X Bi X )((TiZr) 1-Y Nb Y )O 3 , wherein:
X is 0.05 to 0.1; and Y is 0.05 to 0.1.
3 . The method for producing a ferroelectric film according to claim 1 , wherein said ferroelectric film has a relative permittivity of 400 or more.
4 . A ferroelectric film being formed by the method for producing a ferroelectric film according to claim 3 and having a relative permittivity of 400 or more.Cited by (0)
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