US2018265963A1PendingUtilityA1
Sputtering Target Material
Assignee: SANYO SPECIAL STEEL CO LTDPriority: Sep 18, 2015Filed: Sep 16, 2016Published: Sep 20, 2018
Est. expirySep 18, 2035(~9.1 yrs left)· nominal 20-yr term from priority
C22C 19/07C22C 33/0278C22C 38/08C22C 30/00B22F 2998/10H01F 41/183C23C 14/3414C22C 33/0257C22C 33/0285C22C 38/002C22C 38/10C22C 38/14C22C 38/18C22C 38/12H01J 37/3426C22C 38/16C22C 1/0433B22F 1/052C22C 1/04C23C 14/3407
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Claims
Abstract
An object of the present invention is to improve the mechanical strength of a sputtering target, and in order to achieve such an object, there is provided a sputtering target material including: in at. %, 10 to 50% of B; 0 to 20% in total of one or more elements selected from Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Re, Ru, Rh, Ir, Ni, Pd, Pt, Cu, and Ag; and the balance of at least one of Co and Fe, and unavoidable impurities, in which a hydrogen content is 20 ppm or less.
Claims
exact text as granted — not AI-modified1 . A sputtering target material comprising in at. %: 10 to 50% of B; 0 to 20% in total of one or more elements selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Re, Ru, Rh, Ir, Ni, Pd, Pt, Cu, and Ag; and the balance of at least one of Co and Fe, and unavoidable impurities, wherein a hydrogen content is 20 ppm or less.
2 . The sputtering target material according to claim 1 , wherein the sputtering target material comprises, in at. %, 5 to 20% in total of one or more elements selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Re, Ru, Rh, Ir, Ni, Pd, Pt, Cu, and Ag.
3 . The sputtering target material according to claim 1 , wherein the sputtering target material has a bending strength of 200 MPa or more.Join the waitlist — get patent alerts
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