US2018305822A1PendingUtilityA1
Electroplating and Electrophoretic Deposition over Surfaces of Metal Substrate
Assignee: HEWLETT PACKARD DEVELOPMENT COPriority: May 6, 2015Filed: May 6, 2015Published: Oct 25, 2018
Est. expiryMay 6, 2035(~8.8 yrs left)· nominal 20-yr term from priority
C23C 28/00C25D 13/22C25D 5/10C25D 13/02C23C 28/322C23C 28/34C23C 28/023
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Claims
Abstract
Various examples described herein provide for a substrate, or a method for preparing a substrate, including a first electroplated layer disposed over a metal substrate, a second electroplated layer disposed under the metal substrate, and an electrophoretic deposition layer disposed over the first electroplated layer.
Claims
exact text as granted — not AI-modified1 . A method, comprising:
forming a first electroplated layer over a metal substrate; forming a second electroplated layer under the metal substrate; and forming an electrophoretic deposition layer over the first electroplated layer.
2 . The method of claim 1 , comprising disposing a functional coating over the electrophoretic deposition layer.
3 . The method of claim 1 , comprising disposing a functional coating under the second electroplated layer.
4 . The method of claim 1 , comprising forming a second electrophoretic deposition layer over the second electroplated layer.
5 . The method of claim 4 , comprising disposing a functional coating over the second electrophoretic deposition layer.
6 . The method of claim 1 , wherein forming the electrophoretic deposition layer over the first electroplated layer comprises:
activating an exterior surface of the first electroplated layer; and performing electrophoretic deposition on the activated exterior surface of the first electroplated layer to form the electrophoretic deposition layer.
7 . The method of claim 1 , wherein forming the first electroplated layer over the metal substrate comprises:
activating an upper-side exterior surface of the metal substrate to produce an activated upper-side exterior surface; and electroplating the activated upper-side exterior surface to form the first electroplated layer.
8 . The method of claim 1 , wherein forming the second electroplated layer under the metal substrate comprises:
activating an underside exterior surface of the metal substrate to produce an activated underside exterior surface; and electroplating the activated underside exterior surface to form the second electroplated layer.
9 . A method, comprising:
electroplating a first exterior surface of a metal substrate; electroplating a second exterior surface of the metal substrate, the second exterior surface being opposite the first exterior surface; and performing electrophoretic deposition on the electroplated first exterior surface.
10 . The method of claim 9 , performing electrophoretic deposition on the electroplated second exterior surface.
11 . A substrate, comprising:
an electrophoretic deposition layer disposed over a first electroplated layer; the first electroplated layer disposed over a metal substrate; the metal substrate disposed over a second electroplated layer, and the second electroplated layer.
12 . The substrate of claim 11 , comprising a functional coating disposed over the electrophoretic deposition layer.
13 . The substrate of claim 11 , comprising a functional coating disposed under the second electroplated layer.
14 . The substrate of claim 11 , comprising a second electrophoretic deposition layer disposed under the second electroplated layer.
15 . The substrate of claim 14 , comprising a functional coating disposed under the second electrophoretic deposition layer.Join the waitlist — get patent alerts
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