US2018334744A1PendingUtilityA1
Evaporation vessel apparatus and method
Est. expiryMar 27, 2029(~2.7 yrs left)· nominal 20-yr term from priority
C23C 14/54C30B 23/00C23C 16/4482C30B 25/14C23C 14/0629C23C 16/306C23C 14/0617C23C 16/455C23C 16/301C23C 14/243C23C 16/52H10P 14/40
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Claims
Abstract
Disclosed is a method of providing a constant concentration of a metal-containing precursor compound in the vapor phase in a carrier gas. Such method is particularly useful in supplying a constant concentration of a gaseous metal-containing compound to a plurality of vapor deposition reactors.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . An apparatus for delivering a substantially constant concentration of a vaporized precursor compound in a carrier gas to a plurality of vapor deposition reactors, comprising: an evaporation vessel comprising a chamber containing a precursor compound to be vaporized, the evaporation vessel having a gas inlet and a gas outlet, a carrier gas feed line in fluid communication with the gas inlet, and a gas exit line in fluid communication between the gas outlet and a plurality of vapor deposition reactors; a carrier gas control valve in the carrier gas feed line; a concentration transducer for sensing a concentration of the vaporized precursor compound in a gaseous mixture in the gas exit line; a controller in electrical connection with the carrier gas control valve and the concentration transducer; the concentration transducer adapted to send a sensed concentration to the controller; the controller adapted to compare the sensed concentration (c) with a reference concentration (c 0 ) to provide a concentration differential (c−c 0 ), the controller adapted to generate a signal utilizing the concentration differential and to transmit the signal to the carrier gas control valve wherein the signal acts on the carrier gas control valve to adjust total pressure in the evaporation vessel in order to maintain a substantially constant concentration of the vaporized precursor compound in the gaseous mixture in the gas exit line.
2 . The apparatus of claim 1 , wherein a second gas control valve is present in the gas exit line.
3 . The apparatus of claim 1 , wherein the gas exit line further comprises a pressure release valve.
4 . The apparatus of claim 1 , wherein the concentration transducer is an acoustic concentration transducer.
5 . The apparatus of claim 1 , wherein the gas exit line further comprises a pressure transducer and wherein the pressure transducer is electrically connected to the controller.
6 . The apparatus of claim 1 , wherein the controller is configured maintain the substantially constant concentration of the vaporized precursor compound in the gaseous mixture in the gas exit line with steps selected from the group consisting of:
1) sensing the concentration of vaporized precursor compound in the gaseous mixture with the concentration transducer in the gas exit line, comparing the sensed concentration with a reference concentration to provide a concentration differential, generating a signal in the controller utilizing the concentration differential, transmitting the signal to the gas control valve wherein the signal is configured to adjust the gas control valve to adjust the total pressure within the evaporation vessel in order to maintain a substantially constant concentration of the vaporized precursor compound in the gaseous mixture in the gas exit line; 2) sensing a temperature of the vaporized precursor compound within the evaporation vessel with a temperature sensing means, comparing the sensed temperature with a reference temperature to provide a temperature differential, generating a signal in the controller utilizing the temperature differential, transmitting the signal to the gas control valve wherein the signal adjusts the gas control valve to adjust the total pressure within the evaporation vessel in order to maintain a substantially constant concentration of the vaporized precursor compound in the gaseous mixture in the gas exit line; and 3 ) a combination of (1) and (2).
7 . The apparatus of claim 6 , wherein the temperature sensing means comprises:
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