Material comprising a functional layer made from silver, crystallised on a nickel oxide layer

Abstract

A process for obtaining a material including a transparent substrate coated with a stack of thin layers which are deposited by cathode sputtering, the stack of thin layers includes at least one silver-based functional metal layer and at least two antireflective coatings, each antireflective coating including at least one dielectric layer, so that each functional metal layer is positioned between two antireflective coatings, the process including: (a) depositing an antireflective coating including at least one thin layer based on crystalline nickel oxide, wherein the at least one thin layer based on crystalline nickel oxide is devoid of a nickel and chromium alloy, then (b) depositing at least one silver-based functional metal layer above and in contact with the thin layer based on crystalline nickel oxide.

1 . A process for obtaining a material comprising a transparent substrate coated with a stack of thin layers which are deposited by cathode sputtering, the stack of thin layers comprising at least one silver-based functional metal layer and at least two antireflective coatings, each antireflective coating comprising at least one dielectric layer, so that each functional metal layer is positioned between two antireflective coatings, the process comprising:
 (a) depositing an antireflective coating comprising at least one thin layer based on crystalline nickel oxide, wherein the at least one thin layer based on crystalline nickel oxide is devoid of a nickel and chromium alloy, then   (b) depositing at least one silver-based functional metal layer above and in contact with the thin layer based on crystalline nickel oxide.   
     
     
         2 . The process for obtaining a material as claimed in  claim 1 , wherein all the layers of the stack are produced and a crystallization heat treatment is carried out in a chamber for deposition by cathode sputtering. 
     
     
         3 . The process for obtaining a material as claimed in  claim 1 , further comprising stage (c) during which the substrate coated with the stack of thin layers is subjected to a heat treatment at a temperature greater than 400° C. 
     
     
         4 . The process for obtaining a material as claimed in  claim 3 , wherein the temperature is greater than 500° C. 
     
     
         5 . The process for obtaining a material as claimed in  claim 1 , wherein the cathode sputtering is assisted by a magnetic field. 
     
     
         6 . The process for obtaining a material as claimed in  claim 1 , wherein the at least one silver-based functional metal layer comprises monocrystalline grains oriented so that the grains have the family of {200} planes parallel to a surface of the transparent substrate. 
     
     
         7 . The process for obtaining a material as claimed in  claim 1 , wherein the at least one thin layer based on crystalline nickel oxide has a thickness of at least 0.5 nm. 
     
     
         8 . The process for obtaining a material as claimed in  claim 1 , wherein the at least one thin layer based on crystalline nickel oxide has a thickness of less than 4 nm. 
     
     
         9 . The process for obtaining a material as claimed in  claim 1 , wherein the transparent substrate is a glass substrate. 
     
     
         10 . The process for obtaining a material as claimed in  claim 1 , wherein the transparent substrate coated with the stack is a bent or tempered glass, or both a bent and tempered glass. 
     
     
         11 . The process for obtaining a material as claimed in  claim 1 , further comprising an upper protective layer as the last layer of the stack. 
     
     
         12 . The process for obtaining a material as claimed in  claim 11 , wherein the upper protective layer is a TiO 2  layer.