Plasma cvd apparatus, plasma cvd method, and agitating device

Abstract

A plasma CVD apparatus efficiently coats the surfaces of fine particles with a thin film or super-fine particles by concentrating a plasma near the fine particles. The plasma CVD apparatus includes a chamber, a container disposed in the chamber for housing the fine particles, the container having a polygonal inner shape in a cross section substantially perpendicular to a longitudinal axis of the container, a ground shielding member for shielding a surface of the container other than a housing face, a rotation mechanism for causing the container to rotate or act as a pendulum on an axis of rotation substantially perpendicular to the cross section, an opposed electrode disposed in the container so as to face the housing face, a plasma power source electrically connected to the container, a gas introducing mechanism for introducing a raw gas into the container, and an evacuation mechanism for evacuating the chamber.

1 - 18 . (canceled) 
     
     
         19 . A plasma CVD method comprising the steps of:
 housing fine particles or electronic parts in a container having a circular inner shape in a section approximately parallel to the direction of the gravity,   shielding the surface of the container other than a housing face for housing the fine particles or the electronic parts with a ground shielding member,   disposing an opposed electrode facing the housing face in the container,   evacuating the inside of the container,   causing the container to rotate or act as a pendulum on the axis of rotation approximately perpendicular to the section,   introducing a raw gas into the container, and   supplying a plasma power to the container to coat the surfaces of said fine particles or said electronic parts with super-fine particles having smaller diameters than said fine particles or said electronic parts, or with a thin film by a plasma CVD method while agitating or rotating the fine particles or the electronic parts in the container.   
     
     
         20 . A plasma CVD method comprising the steps of:
 housing fine particles or electronic parts in a container having a polygonal inner shape in a section approximately parallel to the direction of the gravity,   shielding the surface of the container other than a housing face for housing the fine particles or the electronic parts with a ground shielding member,   disposing an opposed electrode facing the housing face in the container,   evacuating the inside of the container,   causing the container to rotate or act as a pendulum on the axis of rotation approximately perpendicular to the section,   introducing a raw gas into the container, and   supplying a plasma power to the container to coat the surfaces of said fine particles or said electronic parts with super-fine particles having smaller diameters than said fine particles or said electronic parts, or with a thin film by a plasma CVD method while agitating or rotating the fine particles or the electronic parts in the container.   
     
     
         21 - 23 . (canceled)