US2019058135A1PendingUtilityA1

Perovskite based charge transport layers for thin film optoelecronic devices and methods of making

Assignee: UNIV FLORIDA STATE RES FOUND INCPriority: May 27, 2016Filed: May 27, 2016Published: Feb 21, 2019
Est. expiryMay 27, 2036(~9.8 yrs left)· nominal 20-yr term from priority
Inventors:Biwu MaYu Tian
H01L 51/0003H01L 51/5056H01L 51/5012H01L 51/4213H01L 51/56H01L 51/0077H01L 51/5072H10K 85/50H10K 30/50H10K 71/00H10K 71/441H10K 2101/10H10K 50/15H10K 85/342H10K 30/10H10K 85/60H10K 85/146H10K 50/11H10K 71/12H10K 85/1135H10K 50/16Y02E10/549
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Claims

Abstract

A new type of charge transport layer based on organometal halide perovskite for highly efficient organic light emitting diodes (OLEDs) is demonstrated. By solution processing of halide perovskite precursors, smooth essentially pure perovskite thin films may be prepared with high transparency and conductivity. Solution processed multilayer OLED with this perovskite-based hole transport layer outperforms a device with a PEDOT:PSS layer.

Claims

exact text as granted — not AI-modified
1 . A method for forming a charge transport layer of a thin film optoelectronic device, comprising:
 forming an organometal halide perovskite precursor;   coating a substrate with the organometal halide perovskite precursor to form an organometal halide perovskite layer;   passivating the organometal halide perovskite layer with a solvent during the coating step; and   annealing the passivated organometal halide perovskite layer.   
     
     
         2 . The method of  claim 1 , wherein the organometal halide perovskite precursor comprises a mixture of AX and BX 2 , where A is a cation, B is a metal, and X is a halide ion. 
     
     
         3 . The method of  claim 2 , wherein A comprises methylammonium (CH 3 NH 3 ), formamidinium (NH 2 CHNH 2 ), cesium (Cs), or mixtures thereof. 
     
     
         4 . The method of  claim 2 , wherein B comprises lead (Pb), tin (Sn), germanium (Ge), or mixtures thereof. 
     
     
         5 . The method of  claim 2 , wherein X comprises fluoride (F − ), chloride (Cl − ), bromide (Br − ), iodide (I − ), astatide (At − ), or mixtures thereof. 
     
     
         6 . The method of  claim 2 , wherein forming the organometal halide perovskite precursor comprises mixing AX and BX 2  in a solvent mixture of approximately 7 parts by volume dimethylformamide and approximately 3 parts by volume dimethylsulfoxide. 
     
     
         7 . The method of  claim 6 , wherein the resulting solvent mixture comprises approximately 0.64M AX and approximately 0.4 M BX 2 . 
     
     
         8 . The method of  claim 1 , wherein the organometal halide perovskite layer comprises methylammonium lead chloride (CH 3 NH 3 PbCl 3 ), formamidinium lead chloride (NH 2 CHNH 2 PbCl 3 ), cesium lead chloride (CsPbCl 3 ), or mixtures thereof. 
     
     
         9 . The method of  claim 1 , wherein coating the substrate comprises spin coating the organometal halide perovskite precursor onto the substrate. 
     
     
         10 . The method of  claim 9 , wherein a duration of the spin coating step comprises approximately 30 seconds, and the passivating solvent is added after approximately 6 seconds. 
     
     
         11 . The method of  claim 1 , wherein passivating the organometal halide perovskite layer comprises adding a low polarity organic solvent during the coating step. 
     
     
         12 . The method of  claim 11 , wherein the low polarity organic solvent comprises chloroform, chlorobenzene, toluene, or mixtures thereof. 
     
     
         13 . The method of  claim 1 , wherein annealing the passivated organometal halide perovskite layer comprises heating to approximately 100° C. for 10 minutes. 
     
     
         14 . A method for forming a charge transport layer of a thin film optoelectronic device, comprising:
 forming an organometal halide perovskite precursor by dissolving methylammonium chloride (CH 3 NH 3 Cl) and lead chloride (PbCl 2 ) in a mixture of dimethylformamide and dimethylsulfoxide;   coating a substrate with the organometal halide perovskite precursor to form a layer of methylammonium lead chloride (CH 3 NH 3 PbCl 3 ) on the substrate;   passivating the methylammonium lead chloride layer by adding a low polarity organic solvent during the coating step; and   annealing the passivated methylammonium lead chloride layer.   
     
     
         15 . The method of  claim 14 , wherein the organometal halide perovskite precursor comprises approximately 0.64 M methylammonium chloride and approximately 0.4 M lead chloride. 
     
     
         16 . The method of  claim 14 , wherein the low polarity organic solvent comprises chloroform, chlorobenzene, toluene, or mixtures thereof. 
     
     
         17 . An optoelectronic device, comprising:
 a first charge transport layer;   a photoactive layer; and   a second charge transport layer;   wherein one or both of the first and second charge transport layers comprise methylammonium lead chloride (CH 3 NH 3 PbCl 3 ) deposited from a mixture of methylammonium chloride (CH 3 NH 3 Cl) and lead chloride (PbCl 2 ) in a solution of dimethylformamide and dimethylsulfoxide, passivated with a low polarity organic solvent, and thermally annealed.   
     
     
         18 . The device of  claim 17 , wherein the mixture comprises approximately 0.64M methylammonium chloride and approximately 0.4 M lead chloride. 
     
     
         19 . The device of  claim 17 , wherein the photoactive layer comprises a light emitting layer. 
     
     
         20 . The device of  claim 17 , wherein the photoactive layer comprises a light harvesting layer.

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