Manufacturing processes to synthesize, functionalize, surface treat and/or encapsulate powders, and applications thereof

Abstract

A system, apparatus and method are provided for processing articles. The system includes subsystems for synthesizing, pre-treating, conducting a vapor phase coating process and post-treating articles in the form of powders and solid or porous workpieces. The apparatus permits vapor phase synthesis, treatment and deposition processes to be performed with high efficiency and at high overall throughput. The methods include converting solids, liquids or gases into gaseous and solid streams that can be separated or exchanged with or without treatment and/or coating steps, and produce optimized composite articles for specific applications.

What is claimed is: 
     
         1 . An atomic layer deposition apparatus for processing articles comprising:
 a) a first chamber having at least one of each of a first solids phase inlet, a first solids phase outlet, a first vapor phase inlet and a first vapor phase outlet;   b) a second chamber having at least one of each of a second solids phase inlet, a second solids phase outlet, a second vapor phase inlet and a second vapor phase outlet;   c) a first solids phase valve assembly or solids phase pump assembly in fluid communication with said first solids phase inlet of said first chamber, said first solid phase valve assembly or solids phase pump assembly having at least two actuation mechanisms;   d) a first vapor phase valve assembly or vapor phase pump assembly adjacent to and in fluid communication with said first vapor phase inlet of said first chamber, said first vapor phase valve assembly or vapor phase pump assembly having at least one actuation mechanism;   e) a second solids phase valve assembly or solids phase pump assembly in fluid communication with said second solids phase inlet of said second chamber, said second solid phase valve assembly or solids phase pump assembly having at least two actuation mechanisms;   f) a second vapor phase valve assembly or vapor phase pump assembly adjacent to and in fluid communication with said second vapor phase inlet of said first chamber, said second vapor phase valve assembly or vapor phase pump assembly having at least one actuation mechanism; and   g) a common signal hub.   
     
     
         2 . The apparatus of  claim 1 , wherein each actuation mechanism is configured for bidirectional signal communication with a common signal hub, and comprises:
 i) an instantaneous opening;   ii) an instantaneous closing;   iii) the controlled opening over a programmable time constant;   iv) controlled closing over a programmable time constant,   v) the expansion of a subcomponent to reduce the conductance through the assembly;   vi) the contraction of a subcomponent to increase the conductance through the assembly;   vii) a concave or convex deflection of a subcomponent;   viii) rotation of a subcomponent co-linear with the direction of solid material flow;   ix) rotation of a subcomponent tangential to the direction of solid material flow;   x) an instantaneous increase in conductance to a position less than fully open;   xi) an instantaneous decrease in conductance to a position greater than fully closed;   xii) the actuation of a piston or piston-like subcomponent;   xiii) an actuation delivering a secondary phase to promote aeration, contraction or expansion of the primary phase unit volume; or   xiv) an actuation mechanism initiated by the electrical application of a sinusoidal, dirac function, triangular or rectangular waveform over one or more programmable time constants.   
     
     
         3 . The apparatus of  claim 1 , wherein said first chamber and second chamber are each configured to:
 a) receive a solids phase comprising said articles having a definable specific surface area through each respective solids phase inlet;   b) dispense a solids phase comprising said articles having treated surfaces having a definable specific surface area through each respective solids phase outlet;   c) receive, create and/or accommodate a vapor phase comprising one or more reactive or non-reactive gases or precursors having a definable number of moles or molar flux through each respective vapor phase inlet; and   d) dispense a vapor phase comprising one or more reactive or non-reactive gases or byproducts having a definable number of moles or molar flux through each respective vapor phase outlet.   
     
     
         4 . The apparatus of  claim 1 , wherein said first chamber further comprises a first sensor network comprising two or more sensors, each sensor within said first sensor network configured for delivering one or more signals to said common signal hub, said first sensor network configured to monitor the temperature, pressure and/or composition of a gaseous environment surrounding said articles. 
     
     
         5 . The apparatus of  claim 1 , further comprising at least one control system configured for simultaneously sending a plurality of signals to, and receiving a plurality of signals from, a common signal hub, said control system is configured to provide a controllable unit for regulating material flows throughout the entire apparatus. 
     
     
         6 . The apparatus of  claim 1 , further comprising a third solids phase valve assembly or solids phase pump assembly in fluid communication with:
 a) a second solids phase outlet of said second chamber, said third solids phase valve assembly or solids phase pump assembly having at least two actuation mechanisms; and   b) a first transport unit having one or more actuation mechanisms and is configured for controlling the temperature, pressure and composition of a gaseous environment while regulating the material flow rate of said articles;   wherein said first transport unit is in bidirectional control signal communication with a signal hub, and wherein one or more actuation mechanisms of said first transport unit is configured for synchronous actuation with said third solids phase valve assembly or solids phase pump assembly actuation mechanisms.   
     
     
         7 . The apparatus of  claim 6 , wherein the outlet of said first transport unit is in fluid communication with a fourth solids phase valve assembly or solids phase pump assembly having at least two actuation mechanisms, and wherein one or more actuation mechanisms of said first transport unit is configured for synchronous actuation with said fourth solids phase valve assembly or solids phase pump assembly actuation mechanisms. 
     
     
         8 . The apparatus of  claim 6 , wherein the actuation mechanism of said first transport unit that is configured for synchronous actuation with the actuation mechanism of said third solids phase valve assembly or solids phase pump assembly and the actuation mechanism of said first transport unit that is configured for synchronous actuation with the actuation mechanism of said fourth solids phase valve assembly or solids phase pump assembly are the same. 
     
     
         9 . The apparatus of  claim 6 , wherein the actuation mechanism of said first transport unit that is configured for synchronous actuation with the actuation mechanism of said third solids phase valve assembly or solids phase pump assembly and the actuation mechanism of said first transport unit that is configured for synchronous actuation with the actuation mechanism of said fourth solids phase valve assembly or solids phase pump assembly are different. 
     
     
         10 . The apparatus of  claim 6 , further comprising a second transport unit in fluid communication with said third solids phase valve assembly or solids phase pump assembly, and in parallel with said first transport unit, said second transport unit having one or more actuation mechanisms and is configured for controlling the temperature, pressure and composition of a gaseous environment while regulating the material flow rate of said articles, and wherein said second transport unit is in bidirectional control signal communication with a signal hub, and wherein one or more actuation mechanisms of said second transport unit is configured for synchronous actuation with said third solid phase valve assembly or solid phase pump assembly actuation mechanisms. 
     
     
         11 . The apparatus of  claim 10 , further configured to regulate the flow rate of the solids phase comprising said articles having treated surfaces to each respective transport unit, such that the specific surface area flowing through each transport unit is defined. 
     
     
         12 . The apparatus of  claim 4 , further comprising a third vapor phase valve assembly or vapor phase pump assembly adjacent to and in fluid communication with and interposed between:
 a) said first vapor phase outlet of said first chamber, and   b) a first exhaust return manifold,   said third vapor phase valve assembly or vapor phase pump assembly having at least one actuation mechanism in bidirectional signal communication with said common signal hub and is configured for controlling the pressure of the gaseous environment within said first chamber.   
     
     
         13 . The apparatus of  claim 12 , further comprising a fourth vapor phase valve assembly or vapor phase pump assembly adjacent to and in fluid communication with and interposed between:
 a) said second vapor phase outlet of said second chamber, and   b) a second exhaust return manifold,   said fourth vapor phase valve assembly or vapor phase pump assembly having at least one actuation mechanism in bidirectional signal communication with said common signal hub and is configured for controlling the pressure of the gaseous environment within said second chamber,   wherein at least one actuation mechanism of a fourth vapor phase valve assembly or vapor phase pump assembly is configured for synchronous actuation with at least one actuation mechanism of said third vapor phase valve assembly or vapor phase pump assembly.   
     
     
         14 . The apparatus of  claim 4 , further comprising a first precursor delivery system having one or more actuation mechanisms and in fluid communication with said first vapor phase valve assembly or vapor phase pump assembly, said precursor delivery system comprising:
 i) a vaporizer unit having an external heating mechanism;   ii) a vaporizer unit having an external cooling mechanism;   iii) a vaporizer unit having an internal heating mechanism;   iv) a vaporizer unit having an internal cooling mechanism;   v) a precursor volume controller configurable to the specific articles and processes being carried out in said first chamber;   vi) a liquid precursor injection pumping system;   vii) a solid precursor metering system;   viii) one or more first capillary nozzles sized to the number of moles of precursor intended for delivery into said first chamber;   ix) one or more first expansion tanks each having a definable total internal surface area, where the combination of the total surface area in all first expansion tanks is larger than the total active surface area of the articles to be saturated in said first chamber; and   x) a first vaporizer unit having a rapid thermal treatment system.   
     
     
         15 . The apparatus of  claim 14 , further comprising a second precursor delivery system having one or more actuation mechanisms and in fluid communication with said second vapor phase valve assembly or vapor phase pump assembly, said precursor delivery system comprising: i) a second vaporizer unit having an external heating mechanism, ii) a second vaporizer unit having an external cooling mechanism, iii) a second vaporizer unit having an internal heating mechanism, iv) a second vaporizer unit having an internal cooling mechanism, v) a second precursor volume controller configurable to the specific articles and processes being carried out in said second chamber, vi) a second liquid precursor injection pumping system, vii) a second solid precursor metering system, viii) one or more second capillary nozzles sized to the number of moles of precursor intended for delivery into said second chamber, ix) one or more second expansion tanks each having a definable total internal surface area, where the combination of the total surface area in all second expansion tanks is larger than the total active surface area of the articles to be saturated in said second chamber, x) a second vaporizer unit having a rapid thermal treatment system,
 wherein at least one actuation mechanism of a first precursor delivery system is actuated synchronously with at least one actuation mechanism of said second precursor delivery system.   
     
     
         16 . The apparatus of  claim 1 , configured to carry out one or more of a batch, semi-batch, semi-continuous and continuous atomic layer deposition process or sub-process. 
     
     
         17 . The apparatus of  claim 1 , wherein the second chamber is subjacent to the first chamber. 
     
     
         18 . The apparatus of  claim 7 , wherein at least a portion of the fourth solids valve assembly or pump assembly is located in the same horizontal plane as at least a portion of the first solids valve assembly or solids phase pump assembly. 
     
     
         19 . The apparatus of  claim 18 , wherein the actuation mechanisms of the fourth solids valve assembly or pump assembly are configured for synchronous actuation with the actuation mechanisms of said first solids phase valve assembly or solid phase pump assembly. 
     
     
         20 . The apparatus of  claim 6 , wherein the outlet of said first transport unit is in fluid communication with said first solids phase valve assembly or solids phase pump assembly having at least two actuation mechanisms, and wherein one or more actuation mechanisms of said first transport unit is configured for synchronous actuation with said first solids phase valve assembly or solids phase pump assembly actuation mechanisms. 
     
     
         21 . The apparatus of  claim 1 , wherein the articles are selected from the group consisting of particles, powders and porous supports. 
     
     
         22 . The apparatus of  claim 1 , wherein the apparatus is configured for operation at a minimum pressure of about 0.1 Torr. 
     
     
         23 . The apparatus of  claim 1 , wherein the apparatus is configured to accommodate a pressure drop of up to about 1,500 Torr.