US2019193370A1PendingUtilityA1

Metal-and-resin composite and method for making the same

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Assignee: SHENZHEN FUTAIHONG PREC IND COPriority: Dec 9, 2014Filed: Mar 5, 2019Published: Jun 27, 2019
Est. expiryDec 9, 2034(~8.4 yrs left)· nominal 20-yr term from priority
B32B 2311/18B32B 2311/24B32B 27/285B32B 2310/00B32B 15/04B29C 45/14311B32B 2250/02B32B 27/288B32B 27/06B29C 45/00B32B 27/304B32B 3/26B32B 2311/20B32B 2605/08B32B 2509/00B32B 2255/20B32B 2255/06B32B 15/20B32B 15/18B32B 15/09B32B 15/08B29C 2045/14868Y10T428/24996B32B 27/365B32B 27/36B32B 27/286B32B 2369/00B32B 2311/30B32B 2327/06B32B 2367/00B32B 2371/00
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Claims

Abstract

A method for making a metal-and-resin composite, including: providing a metal substrate made of stainless steel; forming a plurality of nano pores on a surface of the metal substrate by chemical etching the metal substrate; forming an intermediate layer on the metal substrate by dipping the metal substrate in a coupling agent solution, the intermediate layer filling at least portion of each nano pore; and forming a resin member by placing the metal substrate in a mold and molding molten resin on a surface of the intermediate layer, the resin member covering and bonding with the intermediate layer, treating the metal substrate with a coupling solution having a silane compound coupling agent to make the intermediate layer.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A method for making a metal-and-resin composite, comprising:
 providing a metal substrate, the metal substrate being made of stainless steel;   forming a plurality of nano pores on a surface of the metal substrate by chemical etching the metal substrate;   forming an intermediate layer on the metal substrate by dipping the metal substrate in a coupling agent solution, the intermediate layer filling at least portion of each of the nano pores;   forming a resin member placing the metal substrate in a mold and molding molten resin on a surface of the intermediate layer, the resin member covering and bonding with the intermediate layer; and   treating the metal substrate with a coupling solution having a silane compound coupling agent to make the intermediate layer.   
     
     
         2 . The method as claimed in  claim 1 , the method of forming the intermediate layer comprises dipping the metal substrate in the coupling agent solution having a concentration of approximately 10 ml/L to approximately 100 ml/L and a temperature of approximately 25° C. to approximately 100° C. for approximately 1 second to approximately 5 minutes, a thickness of the intermediate layer is in a range of approximately 0.5 nm to approximately 10 nm. 
     
     
         3 . The method as claimed in  claim 1 , wherein the coupling agent is a titanate coupling agent, a zirconate coupling agent, the silane compound coupling agent, a boric acid ester coupling agent, or a sulfonic acid coupling agent. 
     
     
         4 . The method as claimed in  claim 1 , the method of forming the nano pores comprises dipping the metal substrate in a chemical etching solution having a concentration of approximately 100-980 ml/L and a temperature of approximately 10° C. to approximately 120° C. for approximately 1 minute to approximately 120 minutes, and then drying the coupling agent solution to form the intermediate layer. 
     
     
         5 . The method as claimed in  claim 1 , wherein diameters of the nano pores are in a range of approximately 10 nm to approximately 1000 nm, and depths of the nano pores are in a range of approximately 0.1 μm to of the nano pores are in a range of approximately 20 μm. 
     
     
         6 . The method as claimed in  claim 1 , wherein a portion of each of the nano pores is not filled with the intermediate layer, and a diameter of the portion of each of the nano pores not filled with the intermediate layer is in a range of approximately 10 nm to approximately 990 nm. 
     
     
         7 . The method as claimed in  claim 6 , wherein the resin member fills the portion of each of the nano pores which are not filled with the intermediate layer. 
     
     
         8 . The method as claimed in  claim 1 , wherein the resin member is made of polybutylene terephthalate, polyphenylene sulfide, polyethylene terephthalate, polyetheretherketone, polycarbonate, or polyvinyl chloride. 
     
     
         9 . The method as claimed in  claim 1 , wherein the resin member and the intermediate layer are bonded primarily through chemical bonds. 
     
     
         10 . A method for making a metal-and-resin composite, comprising:
 providing a metal substrate;   forming a plurality of nano pores on a surface of the metal substrate by chemical etching the metal substrate;   forming an intermediate layer on the metal substrate by dipping the metal substrate in a coupling agent solution, the intermediate layer filling at least portion of each of the nano pores; and   forming a resin member by placing the metal substrate in a mold and molding molten resin on a surface of the intermediate layer, the resin member covering and bonding with the intermediate layer.   
     
     
         11 . The method as claimed in  claim 10 , the method of forming the intermediate layer comprises dipping the metal substrate in the coupling agent solution having a concentration of approximately 10 ml/L to approximately 100 ml/L and a temperature of approximately 20 oC to approximately 100 oC for approximately 1 second to approximately 5 minutes, a thickness of the intermediate layer is in a range of approximately 0.5 nm to approximately 10 nm. 
     
     
         12 . The method as claimed in  claim 10 , wherein the coupling agent is a titanate coupling agent, a zirconate coupling agent, a silane compound coupling agent, a boric acid ester coupling agent, or a sulfonic acid coupling agent. 
     
     
         13 . The method as claimed in  claim 10 , the method of forming the nano pores comprises dipping the metal substrate in a chemical etching solution having a concentration of about 100-980 ml/L and a temperature of approximately 10 oC to approximately 120 oC for approximately 1 minute to approximately 120 minutes, and then drying the coupling agent solution to form the intermediate layer. 
     
     
         14 . The method as claimed in  claim 10 , wherein diameters of the nano pores are in a range of approximately 10 nm to approximately 1000 nm, and depths of the nano pores are in a range of approximately 0.1 μm to of the nano pores are in a range of approximately 20 μm. 
     
     
         15 . The method as claimed in  claim 10 , wherein a portion of each of the nano pores is not filled with the intermediate layer, and a diameter of the portion of each of the nano pores not filled with the intermediate layer is in a range of approximately 10 nm to approximately 990 nm. 
     
     
         16 . The method as claimed in  claim 15 , wherein the resin member fills the portion of each of the nano pores which are not filled with the intermediate layer. 
     
     
         17 . The method as claimed in  claim 10 , wherein the resin member is made of polybutylene terephthalate, polyphenylene sulfide, polyethylene terephthalate, polyetheretherketone, polycarbonate, or polyvinyl chloride. 
     
     
         18 . The method as claimed in  claim 10 , wherein the resin member and the intermediate layer are bonded primarily through chemical bonds. 
     
     
         19 . The method as claimed in  claim 10 , wherein the metal substrate is made of stainless steel, aluminum alloy, titanium alloy, aluminum-magnesium alloy, or zinc alloy.

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