Methods and apparatuses for treatment of meibomian glands

Abstract

Methods and apparatuses of treating meibomian glands are disclosed. An apparatus suitable to treat meibomian glands comprises a heat source, a controller, and a pressure applicator. The heat source is configured to apply regulated heat to an eyelid containing at least one meibomian gland to reach a temperature adequate to melt at least one obstruction within the at least one meibomian gland and place the at least one obstruction in a melted state. The controller is configured to maintain the regulated heat for a time period adequate to melt the at least one obstruction and place the at least one obstruction in the melted state. The pressure applicator is configured to be placed into direct contact with the eyelid and apply a pressure over at least a portion of the eyelid to express the at least one obstruction from the at least one meibomian gland.

What is claimed is: 
     
         1 . An apparatus for treating meibomian glands having a meibomian gland channel and a meibomian gland orifice at a top of the meibomian gland channel, comprising:
 a heat source configured to apply regulated heat to an eyelid containing at least one meibomian gland to reach a temperature adequate to melt at least one obstruction within the at least one meibomian gland and place the at least one obstruction in a melted state;   a controller configured to maintain the regulated heat for a time period adequate to melt the at least one obstruction and place the at least one obstruction in the melted state; and   a pressure applicator configured to be placed into direct contact with the eyelid and apply a pressure over at least a portion of the eyelid to express the at least one obstruction from the at least one meibomian gland.   
     
     
         2 . The apparatus according to  claim 1 , wherein the at least one obstruction is located within the meibomian gland channel, and
 the heat source is configured to apply the regulated heat to reach a temperature adequate to melt the at least one obstruction located in the meibomian gland channel;   the controller is configured to maintain the regulated heat for the time period adequate to place the at least one obstruction located in the meibomian gland channel in the melted state; and   the pressure applicator is configured to apply a pressure to the meibomian gland channel to express the at least one obstruction from within the meibomian gland channel through the meibomain gland orifice.   
     
     
         3 . The apparatus according to  claim 1 , wherein the time period comprises approximately 10 to 60 minutes. 
     
     
         4 . The apparatus according to  claim 1 , wherein the pressure applicator is at least partially heated. 
     
     
         5 . The apparatus according to  claim 1 , wherein the heat source is configured to apply the regulated heat until the temperature reaches approximately 45 degrees Celsius. 
     
     
         6 . The apparatus according to  claim 1 , wherein the heat source is configured to apply the regulated heat until the temperature reaches between approximately 44 and 47 degrees Celsius. 
     
     
         7 . The apparatus according to  claim 1 , wherein the heat source is configured to apply the regulated heat until the temperature is at least 37 degrees Celsius. 
     
     
         8 . The apparatus according to  claim 1 , wherein the pressure applicator is further configured to apply the pressure within 3 minutes after an end of the time period. 
     
     
         9 . The apparatus according to  claim 2 , wherein the pressure applicator is further configured to milkingly express the melted at least one obstruction located within the meibomian gland channel from within the meibomian gland channel through the meibomian gland orifice of one or more of the meibomian glands. 
     
     
         10 . The apparatus according to  claim 1 , wherein at least one of the heat source and the controller is further configured to repeat the applying and maintaining of the regulated heat after a time interval to maintain flow of fluids from the meibomian glands. 
     
     
         11 . The apparatus according to  claim 10 , wherein the pressure applicator is further configured to repeat the applying of the pressure at the time interval to maintain the flow of fluids from the meibomian glands. 
     
     
         12 . The apparatus according to  claim 1 , wherein the pressure applicator is further configured to apply mechanical energy stimulation to the eyelid. 
     
     
         13 . The apparatus according to  claim 1 , wherein the pressure applicator is further configured to squeeze the eyelid and apply a constant compressive force to the eyelid. 
     
     
         14 . The apparatus according to  claim 1 , wherein the pressure applicator is further configured to apply vibratory stimulation to the eyelid. 
     
     
         15 . The apparatus according to  claim 1 , wherein the pressure applicator is further configured to apply a pulsating compressive force to the eyelid. 
     
     
         16 . The apparatus according to  claim 1 , wherein at least one of the heat source and the controller is configured to remove the applying of the regulated heat from the eyelid to allow the pressure applicator to apply the pressure to the meibomian glands. 
     
     
         17 . The apparatus according to  claim 1 , wherein the heat source is configured to apply the regulated heat to the meibomian gland channel of one or more of the meibomian glands during the applying of pressure to the one or more of the meibomian glands. 
     
     
         18 . The apparatus according to  claim 1 , wherein the heat source further comprises a heating element. 
     
     
         19 . The apparatus according to  claim 18 , further comprising a thermal heat sink coupled to the heating element in order to transfer heat from the heating element to the eyelid. 
     
     
         20 . The apparatus according to  claim 18 , wherein the heat source further comprises an insulator coupled to the heating element in order to reduce heat loss. 
     
     
         21 . The apparatus according to  claim 20 , further comprising a back plate that couples to the insulator. 
     
     
         22 . The apparatus according to  claim 1 , wherein the heat source is configured to apply light energy to the eyelid containing the at least one meibomian gland to reach the temperature adequate to melt the at least one obstruction within the at least one meibomian gland and place the at least one obstruction in a melted state.