US2019317624A1PendingUtilityA1

Semiconductor device and touch panel

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Assignee: SEMICONDUCTOR ENERGY LABPriority: Apr 13, 2015Filed: Jun 26, 2019Published: Oct 17, 2019
Est. expiryApr 13, 2035(~8.8 yrs left)· nominal 20-yr term from priority
G06F 2203/04103H01L 29/78696H01L 29/7869H01L 27/1222G06F 3/044H01L 27/323H01L 27/1255G06F 3/0412H01L 27/124H01L 29/66969H01L 29/24H01L 27/1225H10D 30/6757H10D 30/6755H10D 99/00H10D 62/80H10D 86/441H10D 86/481H10D 86/60H10D 86/423H10D 86/421G06F 3/04184G06F 3/0446H10K 59/40
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Claims

Abstract

A touch panel including an oxide semiconductor film having conductivity is provided. The touch panel includes a transistor, a second insulating film, and a touch sensor. The transistor includes a gate electrode; a gate insulating film; a first oxide semiconductor film; a source electrode and a drain electrode; a first insulating film; and a second oxide semiconductor film. The second insulating film is over the second oxide semiconductor film so that the second oxide semiconductor film is positioned between the first insulating film and the second insulating film. The touch sensor includes a first electrode and a second electrode. One of the first and second electrodes includes the second oxide semiconductor film.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A semiconductor device comprising:
 a transistor comprising a gate electrode, a gate insulating film, and a semiconductor film between the gate electrode and the gate insulating film;   an insulating film over the transistor;   a light-emitting element comprising a first electrode, an EL layer over the first electrode, and a second electrode over the EL layer; and   a touch sensor comprising the second electrode and a third electrode.   
     
     
         2 . The semiconductor device according to  claim 1 , wherein the semiconductor film is an oxide semiconductor film. 
     
     
         3 . The semiconductor device according to  claim 2 ,
 wherein the oxide semiconductor film is an In-M-Zn oxide, and   wherein M is Al, Ti, Ga, Y, Zr, La, Ce, Nd, Sn, or Hf.   
     
     
         4 . The semiconductor device according to  claim 1 , wherein the insulating film comprises hydrogen. 
     
     
         5 . An electronic device comprising:
 the semiconductor device according to  claim 1 ; and   a switch, a speaker, a display portion, or a housing.   
     
     
         6 . A semiconductor device comprising:
 a transistor comprising a gate electrode, a gate insulating film, and a semiconductor film between the gate electrode and the gate insulating film;   an insulating film over the transistor;   a liquid crystal element comprising a first electrode, a second electrode, and a liquid crystal layer; and   a touch sensor comprising the second electrode and a third electrode over the first electrode and the second electrode.   
     
     
         7 . The semiconductor device according to  claim 6 , wherein the semiconductor film is an oxide semiconductor film. 
     
     
         8 . The semiconductor device according to  claim 7 ,
 wherein the oxide semiconductor film is an In-M-Zn oxide, and   wherein M is Al, Ti, Ga, Y, Zr, La, Ce, Nd, Sn, or Hf.   
     
     
         9 . The semiconductor device according to  claim 6 , wherein the insulating film comprises hydrogen. 
     
     
         10 . An electronic device comprising:
 the semiconductor device according to  claim 6 ; and   a switch, a speaker, a display portion, or a housing.

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