Rf energy application based on electromagnetic feedback

Abstract

Method of processing an object in a cavity by application of radio frequency (RF) energy via a plurality of radiating elements. The method comprising applying a first amount of RF energy to the cavity at a first plurality of excitation setups, wherein applying energy at each excitation setup of the first plurality of excitation setups comprises applying RF energy via a plurality of radiating elements at a common frequency and during overlapping time periods. For each radiating element, one measures during the application of each of the plurality of excitation setups, electromagnetic feedback. The method further includes applying a second amount of RF energy to the energy application zone at one or more excitation setups, at least one of which is not included in the first plurality of excitation setups and selected based on the electromagnetic feedback.

1 - 54 . (canceled) 
     
     
         55 . A method of processing an object in a cavity by application of radio frequency (RF) energy via a plurality of radiating elements, the method comprising:
 applying a first amount of RF energy to the cavity at a first plurality of excitation setups, wherein applying energy at each excitation setup of the first plurality of excitation setups comprises applying RF energy via a plurality of radiating elements at a common frequency and during overlapping time periods;   for each radiating element, measuring during the application of each of the plurality of excitation setups, electromagnetic feedback; and   applying a second amount of RF energy to the energy application zone at one or more excitation setups, at least one of which is not included in the first plurality of excitation setups and selected based on the electromagnetic feedback.   
     
     
         56 . The method of  claim 55 , wherein applying energy at each excitation setup of the first plurality of excitation setups comprises controlling the common frequency and a phase difference between signals emitted by different ones of the radiating elements. 
     
     
         57 . The method of  claim 55 , wherein applying energy at each excitation setup of the first plurality of excitation setups comprises controlling the common frequency and an amplitude ratio or amplitude difference between signals emitted by different ones of the radiating elements. 
     
     
         58 . The method of  claim 56 , wherein applying energy at each excitation setup of the first plurality of excitation setups further comprises controlling an amplitude ratio or amplitude difference between signals emitted by different ones of the radiating elements. 
     
     
         59 . The method of  claim 55 , wherein an average amount of energy per excitation setup applied at the first plurality of excitation setups is less than an average amount of energy per excitation setup applied at the one or more excitation setups. 
     
     
         60 . The method of  claim 55 , wherein average energy application duration per excitation setup at the one or more excitation setups is at least 10 times longer than average energy application duration per excitation setup at the first plurality of excitation setups. 
     
     
         61 . The method of  claim 55 , comprising:
 determining a control parameter for each excitation setup included in a second plurality of excitation setups based on the electromagnetic feedback; and   applying the RF energy at the one or more excitation setups based on the determined control parameters.   
     
     
         62 . The method of  claim 61 , wherein the control parameter is an S parameter. 
     
     
         63 . The method of  claim 61 , wherein the control parameter is a dissipation ratio. 
     
     
         64 . The method of  claim 61 , wherein each control parameter is determined based on the electromagnetic feedback by analytic calculations. 
     
     
         65 . The method of  claim 61 , wherein the number of excitation setups included in the second plurality of excitation setups is at least twice the number of excitation setups included in the first plurality of excitation setups. 
     
     
         66 . An apparatus for processing an object in a cavity by application of radio frequency (RF) energy via a plurality of radiating elements, the apparatus comprising:
 a controller configured to:   cause a source of RF energy to apply a first amount of RF energy to the cavity at a first plurality of excitation setups, each applied by applying RF energy via a plurality of the radiating elements at a common frequency and during overlapping time durations; and   select at least one excitation setup not included in the first plurality of excitation setups based on electromagnetic feedback received from the cavity during the application of the first amount of RF energy; and   cause the source to apply a second amount of RF energy to the cavity at the selected at least one excitation setup.   
     
     
         67 . The apparatus of  claim 66 , devoid of a phase detector. 
     
     
         68 . The apparatus of  claim 66 , wherein the controller is configured to control the frequency of RF energy supplied by the source to each of the radiating elements, and a phase difference between RF signals supplied by the source to different ones of the radiating elements. 
     
     
         69 . The apparatus of  claim 66 , wherein the controller is configured to control the frequency of RF energy supplied by the source to each of the radiating elements, and an amplitude ratio or amplitude difference between RF signals supplied by the source to different ones of the radiating elements during overlapping time periods. 
     
     
         70 . The apparatus of  claim 68 , wherein the controller is configured to control an amplitude ratio or amplitude difference between RF signals supplied by the source to different ones of the radiating elements during overlapping time periods. 
     
     
         71 . The apparatus of  claim 66 , wherein the controller is configured to:
 determine a control parameter for each excitation setup included in a second plurality of excitation setups based on the electromagnetic feedback received during the first plurality of excitation setups; and   select the at least one excitation setup not included in the first plurality of excitation setups based on the determined control parameters.   
     
     
         72 . The apparatus of  claim 71 , wherein the control parameter is an S parameter. 
     
     
         73 . The apparatus of  claim 71 , wherein the control parameter is a dissipation ratio. 
     
     
         74 . The apparatus of  claim 71 , wherein the controller is configured to determine each control parameter by analytic calculations based on the electromagnetic feedback.