Plating solution and method for producing plated product

Abstract

The present invention provides a plating solution containing chromium sulfate and formic acid at a concentration of Cr3+ ions of 0.1 mol/L or more and 1 mol/L or less and a concentration of formic acid of 0.05 mol/L or more and 0.2 mol/L or less.

1 . A plating solution used for trivalent chromium plating, the plating solution comprising chromium sulfate and formic acid at a concentration of Cr 3+  ions of 0.1 mol/L or more and 1 mol/L or less and a concentration of formic acid of 0.05 mol/L or more and 0.2 mol/L or less. 
     
     
         2 . The plating solution according to  claim 1  used for trivalent chromium plating with a plating thickness of 5 μm or more. 
     
     
         3 . A method for producing a plated product, the method comprising a plating step of performing electric plating in a plating bath that contains a plating solution comprising chromium sulfate so as to produce the plated product to which trivalent chromium plating is applied by the plating step, wherein
 the plating solution used in the plating step has a concentration of Cr 3+  ions of 0.1 mol/L or more and 1 mol/L or less,   the plating bath has a temperature of 20° C. or more and less than 40° C., and   the electric plating is performed at a current density of 2 A/dm 2  or more and 20 A/dm 2  or less.