Substrate processing device and substrate processing method

Abstract

A substrate processing device includes a processing tank, a substrate holding unit, a fluid supply unit, and a control unit. The processing tank stores a processing liquid for processing a substrate. The substrate holding unit holds the substrate in the processing liquid in the processing tank. The fluid supply unit supplies a fluid to the processing tank. The control unit controls the fluid supply unit. The control unit controls the fluid supply unit such that the fluid supply unit changes supply of the fluid during a period from a start of supply of the fluid to the processing tank storing the processing liquid in which the substrate is immersed to an end of supply of the fluid to the processing tank storing the processing liquid in which the substrate is immersed.

What is claimed is: 
     
         1 . A substrate processing device comprising:
 a processing tank that stores a processing liquid for processing a substrate;   a substrate holding unit that holds the substrate in the processing liquid in the processing tank;   a fluid supply unit that supplies a fluid to the processing tank; and   a control unit that controls the fluid supply unit,   wherein the control unit controls the fluid supply unit such that the fluid supply unit changes supply of the fluid during a period from a start of supply of the fluid to the processing tank storing the processing liquid in which the substrate is immersed to an end of supply of the fluid to the processing tank storing the processing liquid in which the substrate is immersed.   
     
     
         2 . The substrate processing device according to  claim 1 ,
 wherein the fluid supply unit includes
 a first fluid supply unit which is disposed at a first position inside the processing tank and supplies a fluid to the processing tank, and 
 a second fluid supply unit which is disposed at a second position inside the processing tank and supplies a fluid to the processing tank during a period different from a period during which the first fluid supply unit supplies the fluid. 
   
     
     
         3 . The substrate processing device according to  claim 2 ,
 wherein the control unit controls the first fluid supply unit and the second fluid supply unit such that at least one of the fluid of the first fluid supply unit and the fluid of the second fluid supply unit is supplied to the processing tank by switching between supply of the fluid performed by the first fluid supply unit and supply of the fluid performed by the second fluid supply unit.   
     
     
         4 . The substrate processing device according to  claim 2 ,
 wherein the first fluid supply unit supplies a gas as the fluid to the processing tank, and   wherein the second fluid supply unit supplies a gas as the fluid to the processing tank.   
     
     
         5 . The substrate processing device according to  claim 2 ,
 wherein the first fluid supply unit has a plurality of fluid supply tubes, and   wherein the plurality of fluid supply tubes of the first fluid supply unit are symmetrically disposed with respect to a vertical central axis of the substrate.   
     
     
         6 . The substrate processing device according to  claim 2 ,
 wherein the second fluid supply unit has a plurality of fluid supply tubes, and   wherein the plurality of fluid supply tubes of the second fluid supply unit are symmetrically disposed with respect to a vertical central axis of the substrate.   
     
     
         7 . The substrate processing device according to  claim 1 , further comprising:
 a liquid supply unit that is disposed below the substrate held by the substrate holding unit inside the processing tank and supplies the processing liquid to the processing tank.   
     
     
         8 . The substrate processing device according to  claim 7 ,
 wherein the liquid supply unit has a plurality of liquid supply tubes, and   wherein the plurality of liquid supply tubes of the liquid supply unit are symmetrically disposed with respect to a vertical central axis of the substrate.   
     
     
         9 . The substrate processing device according to  claim 2 , further comprising:
 a liquid supply unit that is disposed below the substrate held by the substrate holding unit inside the processing tank and supplies the processing liquid to the processing tank,   wherein the liquid supply unit includes a first liquid supply tube and a second liquid supply tube,   wherein the first fluid supply unit has a plurality of fluid supply tubes,   wherein at least one fluid supply tube of the plurality of fluid supply tubes of the first fluid supply unit is positioned between a vertical central axis of the substrate and the first liquid supply tube, and   wherein at least another fluid supply tube of the plurality of fluid supply tubes of the first fluid supply unit is positioned between the vertical central axis of the substrate and the second liquid supply tube.   
     
     
         10 . The substrate processing device according to  claim 9 ,
 wherein the second fluid supply unit has a plurality of fluid supply tubes,   wherein at least one fluid supply tube of the plurality of fluid supply tubes of the second fluid supply unit is positioned between the vertical central axis of the substrate and the first liquid supply tube, and   wherein at least another fluid supply tube of the plurality of fluid supply tubes of the second fluid supply unit is positioned between the vertical central axis of the substrate and the second liquid supply tube.   
     
     
         11 . The substrate processing device according to  claim 2 , further comprising:
 a liquid supply unit that is disposed below the substrate held by the substrate holding unit inside the processing tank and supplies the processing liquid to the processing tank,   wherein the liquid supply unit includes a first liquid supply tube and a second liquid supply tube,   wherein the first fluid supply unit has a plurality of fluid supply tubes,   wherein the plurality of fluid supply tubes of the first fluid supply unit include a first fluid supply tube, a second fluid supply tube, a third fluid supply tube, and a fourth fluid supply tube,   wherein the first liquid supply tube is positioned between the first fluid supply tube and the second fluid supply tube of the first fluid supply unit, and   wherein the second liquid supply tube is positioned between the third fluid supply tube and the fourth fluid supply tube of the first fluid supply unit.   
     
     
         12 . The substrate processing device according to  claim 11 ,
 wherein the second fluid supply unit has a plurality of fluid supply tubes,   wherein the plurality of fluid supply tubes of the second fluid supply unit include a fifth fluid supply tube, a sixth fluid supply tube, a seventh fluid supply tube, and an eighth fluid supply tube,   wherein the first liquid supply tube is positioned between the fifth fluid supply tube and the sixth fluid supply tube of the second fluid supply unit, and   wherein the second liquid supply tube is positioned between the seventh fluid supply tube and the eighth fluid supply tube of the second fluid supply unit.   
     
     
         13 . The substrate processing device according to  claim 2 ,
 wherein the first fluid supply unit supplies a processing liquid as the fluid to the processing tank, and   wherein the second fluid supply unit supplies a processing liquid as the fluid to the processing tank.   
     
     
         14 . The substrate processing device according to  claim 1 ,
 wherein the control unit controls the fluid supply unit such that the fluid supply unit moves inside the processing tank.   
     
     
         15 . The substrate processing device according to  claim 1 ,
 wherein a plurality of substrates are arranged in a row, and   wherein the fluid supply unit extends in a direction intersecting a direction in which the substrates are arranged and is positioned between two adjacent substrates of the plurality of substrates.   
     
     
         16 . The substrate processing device according to  claim 15 ,
 wherein the fluid supply unit supplies a liquid to the two substrates.   
     
     
         17 . The substrate processing device according to  claim 1 ,
 wherein the fluid supply unit is disposed below the substrate held by the substrate holding unit inside the processing tank.   
     
     
         18 . The substrate processing device according to  claim 1 , further comprising:
 a straightening plate that faces at least a part of the substrate.   
     
     
         19 . The substrate processing device according to  claim 18 ,
 wherein the straightening plate is attached to the processing tank or the substrate holding unit.   
     
     
         20 . A substrate processing method comprising:
 a step of immersing a substrate in a processing liquid stored in a processing tank; and   a step of supplying a fluid to the processing tank,   wherein the step of supplying a fluid includes a step of changing supply of the fluid during a period from a start of supply of the fluid to the processing tank storing the processing liquid in which the substrate is immersed to an end of supply of the fluid to the processing tank storing the processing liquid in which the substrate is immersed.