Cleaning device using micro/nano-bubbles

Abstract

Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30° C. to 90° C., the mean particle size of the micro/nano-bubbles when measured by an ice embedding method using a cryo-transmission electron microscope being 100 nm or smaller, preferably 30 nm or smaller, and also preferably the density of such bubbles being 10 8 or more bubbles per 1 mL.

1 . The cleaning device that uses micro-nano bubbles, the cleaning device comprising:
 means for sucking gas and liquid;   means for pressurizing simultaneously the gas and the liquid and delivering the same;   a gas-liquid mixing tank for mixing the delivered liquid containing gas with fresh gas to enrich dissolved gas;   means for heating a treatment solution that contains gaseous micro-nano bubbles to a temperature of 30 to 90° C.;   a micro-nano bubble generating device for generating gaseous micro-nano bubbles using the dissolved solution in the gas-liquid mixture state in the gas-liquid mixing tank,   wherein the micro-nano bubbles have a mean particle size of 30 nm or less and density thereof is 10 16  particles or more per 1 mL when determined by a measurement with a cryo-transmission electron microscopy using the ice embedding method,   the micro-nano bubble generating device comprising   an injection nozzle for generating micro-nano bubbles using the gas-dissolved liquid heated by the means for heating,   wherein the injection nozzle comprises   a hollow cylinder having two or more small through-holes therein arranged in the peripheral direction thereof,   wherein the small through-holes are arranged   so that each of openings of the through-holes faces to the other opening on the same plane parallel to the redial cross section of the hollow cylinder,   further so that all the extension lines passing through the cross-sectional center of the small through-holes intersect at the center of the hollow cylinder,   and   a micro-nano bubble discharge port provided on at least one end of the hollow cylinder;   a nozzle header connected to the injection nozzle to spray the treatment solution containing gaseous micro-nano bubbles against a workpiece substrate having a resist film or a contaminant of metal or of metal compound thereon;   and   a holder disposed facing the nozzle header to support the workpiece substrate.   
     
     
         2 . The cleaning device that uses micro-nano bubbles according to  claim 1 , wherein the means for heating is a heating device provided for heating the dissolved solution in the gas-liquid mixture state immediately after delivered from the gas-liquid mixing tank. 
     
     
         3 . The cleaning device that uses micro-nano bubbles according to  claim 2 , wherein the heating device is provided as a heater at least in one location of the bottom and side of the gas-liquid mixing tank. 
     
     
         4 . The cleaning device that uses micro-nano bubbles according to  claim 1 , further comprising a drying means for drying water droplets and moisture on the workpiece substrate before spraying the treatment solution. 
     
     
         5 . The cleaning device that uses micro-nano bubbles according to  claim 1 , wherein the holder is connected to an ultrasonic generator capable of applying ultrasonic vibration on the workpiece substrate. 
     
     
         6 . The cleaning device that uses micro-nano bubbles according to  claim 1 , further comprising a voltage applying device for applying a voltage between the holder to support the workpiece substrate and an electrode to be placed close to the nozzle header for spraying the treatment solution. 
     
     
         7 . The cleaning device that uses micro-nano bubbles according to  claim 1 , further comprising a heating device or a warm-air generator for heating at least one of the nozzle header and the holder. 
     
     
         8 . The cleaning device that uses micro-nano bubbles according to  claim 1 , further comprising an air conditioner, wherein the nozzle header and the holder are surrounded within one compartment and the air conditioner controls the temperature of the inside of the compartment to 30 to 90° C. 
     
     
         9 . The cleaning device that uses micro-nano bubbles according to  claim 1 , wherein the heating temperature is 50 to 85° C.