US2020299842A1PendingUtilityA1

Deposition platform for flexible substrates and method of operation thereof

69
Assignee: APPLIED MATERIALS INCPriority: Mar 28, 2013Filed: Jun 5, 2020Published: Sep 24, 2020
Est. expiryMar 28, 2033(~6.7 yrs left)· nominal 20-yr term from priority
C23C 16/45519C23C 14/562C23C 16/545C23C 16/4409C23C 16/44C23C 16/509
69
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

An apparatus for processing a flexible substrate is provided including a vacuum chamber having a first chamber portion, second chamber portion and third chamber portion. The apparatus further includes an unwinding shaft supporting the flexible substrate to be processed and a winding shaft supporting the flexible substrate after processing, wherein the unwinding shaft and the winding shaft are disposed in the first chamber portion, a first wall separating the first chamber portion from the second chamber portion, wherein the first wall is inclined with respect to a vertical and horizontal orientation, a coating drum having a first portion disposed in the second chamber portion and a second portion disposed in the third chamber portion, and a plurality of processing stations disposed at least partially in the third chamber portion, wherein a majority of the plurality of the processing stations are disposed below a rotational axis of the coating drum.

Claims

exact text as granted — not AI-modified
1 . An apparatus for processing a flexible substrate, comprising:
 a vacuum chamber having a first chamber portion, a second chamber portion and a third chamber portion;   an unwinding shaft for supporting the flexible substrate to be processed and a winding shaft for supporting the flexible substrate after processing, wherein the unwinding shaft and the winding shaft are disposed in the first chamber portion;   a first wall separating the first chamber portion from the second chamber portion, wherein the first wall is inclined with respect to a vertical and horizontal orientation;   a coating drum having a first portion disposed in the second chamber portion and a second portion disposed in the third chamber portion, the coating drum having a rotational axis; and   a plurality of processing stations disposed at least partially in the third chamber portion, wherein a majority of the plurality of the processing stations are disposed below the rotational axis of the coating drum.   
     
     
         2 . The apparatus of  claim 1 , wherein the first wall is inclined at an angle of at least 20 degrees with respect to a vertical orientation. 
     
     
         3 . The apparatus of  claim 1 , wherein the first wall is inclined between about 20° and about 70° with respect to a vertical orientation. 
     
     
         4 . The apparatus of  claim 1 , wherein the rotational axis of the coating drum is disposed below a rotational axis of the unwinding shaft and a rotational axis of the winding shaft. 
     
     
         5 . The apparatus of  claim 1 , wherein
 each processing station comprises a deposition source, and   each processing station is disposed at a vertical location of the rotational axis of the coating drum or below the rotational axis of the coating drum.   
     
     
         6 . The apparatus of  claim 1 , further comprising a first gap sluice separating the first chamber portion from the second chamber portion, wherein the first gap sluice is configured to close on the flexible substrate to provide a vacuum seal between the first chamber portion and the second chamber portion. 
     
     
         7 . The apparatus of  claim 1 , further comprising a second wall separating the second chamber portion from the third chamber portion, wherein the second wall is inclined with respect to a vertical and horizontal orientation. 
     
     
         8 . The apparatus of  claim 7 , wherein the second wall is inclined between about 20° and about 70° with respect to a vertical orientation. 
     
     
         9 . The apparatus of  claim 7 , wherein the second wall is parallel to the first wall. 
     
     
         10 . The apparatus of  claim 1 , wherein a majority of the second portion of the coating drum is located below the rotational axis of the coating drum. 
     
     
         11 . The apparatus of  claim 10 , wherein at least some of the second portion of the coating drum is located above the rotational axis of the coating drum. 
     
     
         12 . An apparatus for processing a flexible substrate, comprising:
 a vacuum chamber having a first chamber portion, a second chamber portion and a third chamber portion;   an unwinding shaft and a winding shaft both disposed in the first chamber portion;   a first wall separating the first chamber portion from the second chamber portion, wherein the first wall is inclined with respect to a vertical and horizontal orientation;   a coating drum having a first portion disposed in the second chamber portion and a second portion disposed in the third chamber portion, the coating drum having a rotational axis; and   a plurality of processing stations disposed at least partially in the third chamber portion.   
     
     
         13 . The apparatus of  claim 12 , wherein the first wall is inclined at an angle of at least 20 degrees with respect to a vertical orientation. 
     
     
         14 . The apparatus of  claim 12 , wherein a majority of the plurality of the processing stations are disposed below the rotational axis of the coating drum. 
     
     
         15 . An apparatus for processing a flexible substrate, comprising:
 a vacuum chamber having a first chamber portion, a second chamber portion and a third chamber portion;   an unwinding shaft for supporting the flexible substrate to be processed and a winding shaft for supporting the flexible substrate after processing, wherein the unwinding shaft and the winding shaft are disposed in the first chamber portion;   a first wall separating the first chamber portion from the second chamber portion, wherein the first wall is inclined with respect to a vertical and horizontal orientation, wherein the first wall is inclined by at least 20 degrees with respect to the vertical orientation;   a first gap sluice separating the first chamber portion from the second chamber portion at a first position on the first wall, the first gap sluice configured to open and close to provide a first vacuum seal between the first chamber portion and the second chamber portion at the first position;   a second gap sluice separating the first chamber portion from the second chamber portion at a second position on the first wall, the second gap sluice configured to open and close to provide a second vacuum seal between the first chamber portion and the second chamber portion at the second position, wherein the first position is spaced apart from the second position in a vertical and horizontal direction;   a coating drum disposed in the second chamber portion and the third chamber portion, the coating drum having a rotational axis; and   a plurality of processing stations disposed at least partially in the third chamber portion, wherein a majority of the plurality of the processing stations are disposed below the rotational axis of the coating drum.   
     
     
         16 . The apparatus of  claim 15 , wherein the first wall is inclined between about 20° and about 70° with respect to a vertical orientation. 
     
     
         17 . The apparatus of  claim 15 , wherein each processing station is disposed at a vertical location of the rotational axis of the coating drum or below the rotational axis of the coating drum.

Cited by (0)

No later patents cite this yet.

References (0)

No backward citations on record.