Planishing roll, method for planishing a flat product therewith and flat product therefrom
Abstract
A planishing roll has a surface structure, in particular for producing flat products from a metallic material, in particular from a steel material. The surface structure has a material ratio of 2% at a depth of 0.2 μm to 9 μm, preferably at a depth of 0.8 μm to 5.5 μm. The depth is measured, starting from a zero line, in the direction of an axis of rotation of the planishing roll, with the zero line running parallel to the axis of rotation of the planishing roll and. Starting from the surface of the planishing roll, the zero line is displaced in the direction of the axis of rotation of the planishing roll until the material ratio of the planishing roll is 0.1%.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A planishing roll comprising a surface structure, in particular for producing a flat product of a metal material, in particular a steel material, said surface structure having a material proportion of 2% at a depth of 0.2 μm to 9 μm, with the depth being measured starting from a zero line in a direction of an axis of rotation of the planishing roll, said zero line extending in parallel relation to the axis of rotation of the planishing roll and being displaced starting from the surface of the planishing roll in the direction of the axis of rotation of the planishing roll until the material proportion is 0.1%.
2 . The planishing roll of claim 1 , wherein the depth is 0.8 μm to 5.5 μm.
3 . The planishing roll of claim 1 , wherein the surface structure has a material proportion of 5% at a depth of 0.7 μm to 12 μm, preferably at a depth of 1.1 μm to 6.5 μm.
4 . The planishing roll of claim 1 , wherein the surface structure has a material proportion of 10% at a depth of 1.0 μm to 15 μm, preferably at a depth of 1.4 μm to 7.4 μm.
5 . The planishing roll of claim 1 , wherein the surface structure is electrolytically structure-chromium plated and hard-chromium plated.
6 . The planishing roll of claim 1 , wherein the surface structure has a roughness Ra=0.3-5 μm and a peak number RPc=50−300 1/cm.
7 . A method for planishing a flat product of a metal material, in particular a steel material, comprising:
rolling the flat product with a planishing roll having a material proportion of 2% at a depth of 0.2 μm to 9 μm, with the depth being measured starting from a zero line in a direction of an axis of rotation of the planishing roll, said zero line extending in parallel relation to the axis of rotation of the planishing roll and being displaced starting from the surface of the planishing roll in the direction of the axis of rotation of the planishing roll until the material proportion is 0.1%.
8 . The method of claim 7 , wherein the depth is 0.8 μm to 5.5 μm.
9 . The method of claim 7 , wherein the surface structure has a material proportion of 5% at a depth of 0.7 μm to 12 μm, preferably at a depth of 1.1 μm to 6.5 μm.
10 . The method of claim 7 , wherein the surface structure has a material proportion of 10% at a depth of 1.0 μm to 15 μm, preferably at a depth of 1.4 μm to 7.4 μm.
11 . The method of claim 7 , further comprising electrolytically structure-chromium plating and hard-chromium plating the surface structure.
12 . The method of claim 7 , wherein the surface structure has a roughness Ra=0.3-5 μm and a peak number RPc=50-3001/cm.
13 . The method of claim 7 , wherein the flat product is rolled with a degree of planishing in a range of 0.1 to 2.0%.Join the waitlist — get patent alerts
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