Treatment solution and treatment method

Abstract

According to one embodiment, a treatment solution is provided. The treatment solution is used for treating halosilanes having a cyclic structure. The treatment solution includes at least one of an inorganic base or an organic base and being basic.

What is claimed: 
     
         1 . A treatment solution for treating halosilanes having a cyclic structure, the treatment solution comprising at least one of an inorganic base or an organic base and being basic. 
     
     
         2 . The treatment solution according to  claim 1  comprising the inorganic base, wherein the inorganic base comprises at least one selected from the group consisting of a metal hydroxide, an alkali metal, a carbonate, a hydrogencarbonate, and a metal oxide. 
     
     
         3 . The treatment solution according to  claim 1  comprising the organic base, wherein the organic base comprises at least one selected from the group consisting of alkylammonium hydroxides, an organometallic compound, a metal alkoxide, an amine, and a heterocyclic amine. 
     
     
         4 . The treatment solution according to  claim 1 , wherein the treatment solution has a pH value of 8 to 14. 
     
     
         5 . The treatment solution according to  claim 1 , wherein the treatment solution further comprises a surfactant. 
     
     
         6 . The treatment solution according to  claim 1 , wherein the treatment solution further comprises a pH buffer. 
     
     
         7 . The treatment solution according to  claim 1 , wherein the halosilanes having the cyclic structure comprise chlorosilanes having a cyclic structure. 
     
     
         8 . The treatment solution according to  claim 1 , wherein the treatment solution is a treatment solution for treating both of the halosilanes having the cyclic structure and halosilanes having a chain structure. 
     
     
         9 . A method for treating halosilanes having a cyclic structure, the method comprising making the halosilanes having the cyclic structure come into contact with the treatment solution according to  claim 1 . 
     
     
         10 . The treatment method according to  claim 9 , comprising, after making the halosilanes having the cyclic structure come into contact with the treatment solution, performing an ultrasonic treatment on a resulting mixture. 
     
     
         11 . A method for treating halosilanes having a cyclic structure, the method comprising:
 making the halosilanes with the cyclic structure come into contact with water to obtain a mixture; and   making the mixture come into contact with the treatment solution according to  claim 1 .   
     
     
         12 . The method according to  claim 9 , wherein the halosilanes having the cyclic structure comprise chlorosilanes having a cyclic structure. 
     
     
         13 . A method for treating a byproduct stemming from a process of depositing a silicon-containing material on a member using a gas which includes silicon and halogen, the method comprising making the byproduct come into contact with a basic treatment solution under inert atmosphere. 
     
     
         14 . The method according to  claim 13 , wherein the halogen of the gas comprises chlorine. 
     
     
         15 . The method according to  claim 11 , wherein the mixture comprises a compound having at least one of a siloxane bond or a silanol group. 
     
     
         16 . A treatment solution for treating a substance including a compound having at least one of a siloxane bond or a silanol group, the treatment solution comprising at least one of an inorganic base or an organic base and being basic.