Film-forming material

Abstract

A film-forming material of the present invention contains an oxyfluoride of yttrium represented by YOXFY (X and Y are numbers satisfying 0<X and X<Y) and YF3, wherein a ratio I2/I1 of a peak height I2 of the (020) plane of YF3 to a peak height I1 of the main peak of YOXFY as analyzed by XRD is from 0.005 to 100. It is preferable that a ratio I4/I1 of a peak height I4 of the main peak of Y2O3 to the peak height I1 of the main peak of YOXFY as analyzed by XRD is 0.01 or less.

1 . A film-forming material comprising:
 an yttrium oxyfluoride represented by YO 0.8 F 1.4  and YF 3 ,   wherein a ratio I 2 /I 1  of a peak height I 2  of the (020) plane of the YF 3  to a height I 1  of a main peak of the YO 0.8 F 1.4  as analyzed by XRD is from 0.01 to 3,   and the film-forming material is obtained by firing a granulated product which is obtained by granulating a powder containing YO 0.8 F 1.4  and YF 3 , and the average particle size D50 of the film-forming material is 0.1 μm to 9 μm.   
     
     
         2 . The film-forming material according to  claim 1 , wherein an oxygen content in the film-forming material is from 0.5 to 11.0 mass %. 
     
     
         3 . The film-forming material according to  claim 1 , wherein a ratio I 3 /I 1  of a peak height I 3  of a main peak of YOF to the peak height I 1  of the main peak of the YO 0.8 F 1.4  as analyzed by XRD is 0.5 or less. 
     
     
         4 . The film-forming material according to  claim 1 , wherein a ratio I 4 /I 1  of a peak height I 4  of a main peak of Y 2 O 3  to the peak height I 1  of the main peak of the YO 0.8 F 1.4  as analyzed by XRD is 0.01 or less. 
     
     
         5 . The film-forming material according to  claim 1 , wherein the film-forming material is in granular form. 
     
     
         6 . The film-forming material according to  claim 1 , wherein the film-forming material is used for a thermal spraying method. 
     
     
         7 . The film-forming material according to  claim 1 , wherein the film-forming material is used for an aerosol deposition method. 
     
     
         8 . The film-forming material according to  claim 1 , wherein the film-forming material is used for an ion plating method. 
     
     
         9 . A method for producing a film, which comprises a step of thermal spraying the film-forming material according to  claim 1 . 
     
     
         10 . A method for producing a film, which comprises a step of aerosol depositing the film-forming material according to  claim 1 . 
     
     
         11 . A method for producing a film, which comprises a step of ion plating the film-forming material according to  claim 1 .