Photolithography for Making Electrochemical Measurements

Abstract

An apparatus for electrochemical experimentation with an isolated microstructural region on a surface comprising a metal sample coated with a photoresist, a region of interest, a light source, comprising optoelectronic devices such as spatial light modulators or digital micromirror devices for direct modulation of the light distribution itself and avoiding the use of a mask, wherein the exposed region is created by light from the light source and wherein the metal sample is immersed.

What we claim is: 
     
         1 . An apparatus for electrochemical experimentation with an isolated microstructural region on a surface comprising:
 a metal sample coated with a photoresist;   a region of interest on the metal sample;   a light source;   wherein the light source comprises laser energy of about 2.6 microJoules corresponding to a fluence of about 200 mJ/cm 2  and is a 355 nm solid state laser with maximum pulse energies of about 300 μJ and pulsewidths of about 30 ns and   comprising optoelectronic devices such as spatial light modulators or digital micromirror devices for direct modulation of the light distribution itself and avoiding the use of a mask;   an exposed region of photoresist and unexposed region of photoresist wherein the exposed region is created by light from the light source and wherein the metal sample is immersed in a developer solution whereby removing the exposed region of photoresist and creating a developed region of unexposed photoresist; and   a water-resistant adhesive strip with a first perforated window over the region of interest and a sealed waterproof container with a second larger perforated window over the first perforated window.   
     
     
         2 . The apparatus for electrochemical experimentation with an isolated microstructural region on a surface of  claim 1   wherein the regions of interest on the sample are translated by an X-Y stage and exposed by light.   
     
     
         3 . The apparatus for electrochemical experimentation with an isolated microstructural region on a surface of  claim 1  utilizing a hard-baking step at a temperature of about 150° C. for about 60 minutes.