Antimicrobial fabric application system

Abstract

An antimicrobial supply system employs a process water supply and incorporates a metallic ion supply connected to the process water supply to provide a high ion concentrate to an output. A dilution reservoir is connected to the metallic ion supply output and has an input from the process water supply. A pump is connected to an output of the reservoir. A manifold connected to the pump provides a dilute concentrate to at least one washing system. An electronics control module is connected to a first flow controller between the process water supply and the metallic ion supply and a second flow controller between the metallic ion supply and the reservoir for dilution control establishing a desired metallic ion concentration.

We claim: 
     
         1 . An antimicrobial treatment system comprising:
 a user interface for receiving input from an operator via the antimicrobial treatment system;   an antimicrobial agent supply providing an antimicrobial agent to a supply output;   a reservoir connected to the antimicrobial agent supply output and comprising a reservoir output;   a pump connected to the reservoir output;   a sensor, wherein the sensor detects an operational parameter of the antimicrobial treatment system; and   an electronics control module connected to the user interface and the sensor, wherein the electronics control module modifies a control parameter of one or more components of the antimicrobial treatment system in response to at least one of: (i) the received operator input; and (ii) the detected operational parameter of the antimicrobial treatment system.   
     
     
         2 . The antimicrobial treatment system of  claim 1 , wherein the user interface comprises a remote interface. 
     
     
         3 . The antimicrobial treatment system of  claim 1 , wherein the antimicrobial agent supply comprises a leak proof container, and the antimicrobial agent comprises a high ion metallic concentrate. 
     
     
         4 . The antimicrobial treatment system of  claim 1 , wherein the detected operational parameter comprises an operational error in the antimicrobial treatment system. 
     
     
         5 . The antimicrobial treatment system of  claim 1 , wherein the modified control parameter comprises an alarm signaled by the antimicrobial treatment system. 
     
     
         6 . The antimicrobial treatment system of  claim 5 , wherein the signaled alarm is displayed via the user interface of the antimicrobial treatment system. 
     
     
         7 . The antimicrobial treatment system of  claim 6 , wherein the user interface comprises a remote interface. 
     
     
         8 . The antimicrobial treatment system of  claim 1 , wherein the modified control parameter comprises an operational correction by the antimicrobial treatment system. 
     
     
         9 . The antimicrobial treatment system of  claim 1 , wherein the modified control parameter comprises a system deactivation by the antimicrobial treatment system. 
     
     
         10 . The antimicrobial treatment system of  claim 1 , wherein the modified control parameter comprises emptying one or more of the components of the antimicrobial treatment system. 
     
     
         11 . The antimicrobial treatment system of  claim 1 , wherein the modified control parameter comprises flushing one or more of the components of the antimicrobial treatment system. 
     
     
         12 . The antimicrobial treatment system of  claim 1 , wherein the sensor is connected to the reservoir. 
     
     
         13 . The antimicrobial treatment system of  claim 1 , wherein the sensor comprises a concentration sensor. 
     
     
         14 . The antimicrobial treatment system of  claim 13 , wherein the electronics control module incorporates a controller receiving input from the concentration sensor, and the controller is adapted to operate the one or more components of the antimicrobial treatment system for an operating period calculated to provide a desired concentration of the antimicrobial agent in the reservoir. 
     
     
         15 . The antimicrobial treatment system of  claim 1 , wherein the sensor comprises a reservoir level sensor. 
     
     
         16 . The antimicrobial treatment system of  claim 15 , wherein the electronics control module incorporates a controller receiving input from the reservoir level sensor, and the controller is adapted to operate the one or more components of the antimicrobial treatment system for an operating period calculated to provide a desired amount of the antimicrobial agent in the reservoir. 
     
     
         17 . The antimicrobial treatment system of  claim 1 , wherein the sensor comprises a low level sensor. 
     
     
         18 . The antimicrobial treatment system of  claim 17 , wherein the electronics control module incorporates a controller receiving input from the low level sensor, and the controller is adapted to operate the one or more components of the antimicrobial treatment system for an operating period calculated to provide a desired amount of the antimicrobial agent in the reservoir. 
     
     
         19 . The antimicrobial treatment system of  claim 1 , wherein the sensor comprises a dose level sensor. 
     
     
         20 . The antimicrobial treatment system of  claim 19 , wherein the electronics control module incorporates a controller receiving input from the dose level sensor, and the controller is adapted to operate the one or more components of the antimicrobial treatment system for an operating period calculated to provide a desired dose of the antimicrobial agent in the reservoir.