US2021085817A1PendingUtilityA1

Methods and Equipment for Treatment of Odorous Gas Streams from Industrial Plants

65
Individually held — no corporate assignee on recordPriority: Jun 28, 2012Filed: Dec 3, 2020Published: Mar 25, 2021
Est. expiryJun 28, 2032(~5.9 yrs left)· nominal 20-yr term from priority
Inventors:Stephen Temple
B01D 53/14A61L 9/145A61L 2209/211B01D 2251/106
65
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Claims

Abstract

The present invention is directed to a gas scrubbing process for removing at least one odorous vaporous compound from a gas stream generated by a rendering process or at least reducing the concentration of that odorous vaporous compound. In one embodiment, a series of two gas/liquid contactors is used, each having a different liquid scrubbing solution, with one scrubbing solution controlled at an alkaline pH and the other scrubbing solution controlled at an acidic pH. In another embodiment, the pH of the respective scrubbing solutions in each of the two gas/liquid contactors is reversed.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A method for reducing the concentration of at least one odorous compound in a gas stream from a rendering process, comprising:
 passing a gas stream comprising at least one odorous compound through a first gas/liquid contactor;   contacting said gas stream in said first gas/liquid contactor with a first liquid scrubbing solution;   passing said gas stream from said first gas/liquid contactor through a second gas/liquid contactor; and   contacting said gas stream in said second gas/liquid contactor with a second liquid scrubbing solution,   wherein said first liquid scrubbing solution comprises an alkaline liquid scrubbing solution comprising hydrogen peroxide and said second liquid scrubbing solution comprises an acidic liquid scrubbing solution comprising a reaction product of hydrogen peroxide and a hydrogen peroxide decomposition additive, or wherein said first liquid scrubbing solution comprises an acidic liquid scrubbing solution comprising a reaction product of hydrogen peroxide and a hydrogen peroxide decomposition additive and said second liquid scrubbing solution comprises an alkaline liquid scrubbing solution comprising hydrogen peroxide.   
     
     
         2 . The method of  claim 1 , wherein said acidic liquid scrubbing solution further comprises a pH of less than 5.0. 
     
     
         3 . The method of  claim 1 , wherein said acidic liquid scrubbing solution further comprises a chelating agent. 
     
     
         4 . The method of  claim 1 , wherein said alkaline liquid scrubbing solution further comprises a reaction product of hydrogen peroxide and a hydrogen peroxide decomposition additive and a pH greater than 8.5. 
     
     
         5 . The method of  claim 1 , wherein said alkaline liquid scrubbing solution further comprises a chelating agent. 
     
     
         6 . The method of  claim 1 , wherein said contacting said gas stream in said first gas/liquid contactor with said first liquid scrubbing solution and said contacting said gas stream in said second gas/liquid contactor with said second liquid scrubbing solution are performed for a first period of time and wherein said first liquid scrubbing solution comprises said alkaline liquid scrubbing solution comprising said hydrogen peroxide and said second liquid scrubbing solution comprises said acidic liquid scrubbing solution comprising said reaction product of said hydrogen peroxide and said hydrogen peroxide decomposition additive, and further comprising:
 contacting said gas stream in said first gas/liquid contactor with a third acidic liquid scrubbing solution after said first period of time; and   contacting said gas stream in said second gas/liquid contactor with a fourth alkaline liquid scrubbing solution after said first period of time.   
     
     
         7 . The method of  claim 6 , wherein said contacting said gas stream in said first gas/liquid contactor with said third liquid scrubbing solution and said contacting said gas stream in said second gas/liquid contactor with said fourth liquid scrubbing solution are performed for a second period of time, and further comprising:
 contacting said gas stream in said first gas/liquid contactor with said first liquid scrubbing solution after said second period of time; and   contacting said gas stream in said second gas/liquid contactor with said second liquid scrubbing solution after said second period of time.   
     
     
         8 . The method of  claim 1 , wherein said contacting said gas stream in said first gas/liquid contactor with said first liquid scrubbing solution and said contacting said gas stream in said second gas/liquid contactor with said second liquid scrubbing solution are performed for a first period of time and wherein said first liquid scrubbing solution comprises said acidic liquid scrubbing solution comprising said reaction product of said hydrogen peroxide and said hydrogen peroxide decomposition additive and said second liquid scrubbing solution comprises said alkaline liquid scrubbing solution comprising said hydrogen peroxide, and further comprising:
 contacting said gas stream in said first gas/liquid contactor with a third alkaline liquid scrubbing solution after said first period of time; and   contacting said gas stream in said second gas/liquid contactor with a fourth acidic liquid scrubbing solution after said first period of time.   
     
     
         9 . The method of  claim 8 , wherein said contacting said gas stream in said first gas/liquid contactor with said third liquid scrubbing solution and said contacting said gas stream in said second gas/liquid contactor with said fourth liquid scrubbing solution are performed for a second period of time, and further comprising:
 contacting said gas stream in said first gas/liquid contactor with said first liquid scrubbing solution after said second period of time; and   contacting said gas stream in said second gas/liquid contactor with said second liquid scrubbing solution after said second period of time.   
     
     
         10 . A method for reducing the concentration of at least one odorous compound in a gas stream from a rendering process, comprising:
 passing a gas stream comprising at least one odorous compound through a first gas/liquid contactor;   contacting said gas stream in said first gas/liquid contactor with an acidic liquid scrubbing solution comprising a reaction product of hydrogen peroxide and a hydrogen peroxide decomposition additive;   passing said gas stream from said first gas/liquid contactor through a second gas/liquid contactor; and   contacting said gas stream in said second gas/liquid contactor with an alkaline liquid scrubbing solution comprising hydrogen peroxide.   
     
     
         11 . The method of  claim 10 , wherein said acidic liquid scrubbing solution further comprises a pH of less than 5.0. 
     
     
         12 . The method of  claim 10 , wherein said acidic liquid scrubbing solution further comprises a chelating agent. 
     
     
         13 . The method of  claim 10 , wherein said alkaline liquid scrubbing solution further comprises a reaction product of hydrogen peroxide and a hydrogen peroxide decomposition additive and a pH greater than 8.5. 
     
     
         14 . The method of  claim 10 , wherein said alkaline liquid scrubbing solution further comprises a chelating agent. 
     
     
         15 . A method for reducing the concentration of at least one odorous compound in a gas stream from a rendering process, comprising:
 passing a gas stream comprising at least one odorous compound through a first gas/liquid contactor;   contacting said gas stream in said first gas/liquid contactor with an alkaline liquid scrubbing solution comprising hydrogen peroxide;   passing said gas stream from said first gas/liquid contactor through a second gas/liquid contactor; and   contacting said gas stream in said second gas/liquid contactor with an acidic liquid scrubbing solution comprising a reaction product of hydrogen peroxide and a hydrogen peroxide decomposition additive.   
     
     
         16 . The method of  claim 15 , wherein said acidic liquid scrubbing solution further comprises a pH of less than 5.0. 
     
     
         17 . The method of  claim 15 , wherein said acidic liquid scrubbing solution further comprises a chelating agent. 
     
     
         18 . The method of  claim 15 , wherein said alkaline liquid scrubbing solution further comprises a reaction product of hydrogen peroxide and a hydrogen peroxide decomposition additive and a pH greater than 8.5. 
     
     
         19 . The method of  claim 15 , wherein said alkaline liquid scrubbing solution further comprises a chelating agent.

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