Self-assembly composition for pattern formation and pattern forming method

Abstract

It is an object of the present invention to provide a self-assembly composition for pattern formation having a wide range of applicable pattern size and being capable of forming a favorable phase-separated structure. The present invention relates to a self-assembly composition for pattern formation, which comprises a block copolymer comprising a polymerization unit (a) having at least one selected from a structure represented by the following formula (103) and a structure represented by the following formula (104), and a polymerization unit (b) having a structure represented by the following formula (105), wherein the content rate of a sugar moiety in the block copolymer is 3% by mass or more and 80% by mass or less based on the total mass of the block copolymer:

1 . A monomer for self-assembly composition for pattern formation, represented by the following formula (103′) or the following formula (104′): 
       
         
           
           
               
               
           
         
         wherein, in the formulae (103′) and (104′), R 1  each independently represents a hydrogen atom, an alkyl group, an acyl group, an aryl group, or a phosphoryl group, and a plurality of R 1  may be identical to or different from one another; R 5  represents a hydrogen atom or an alkyl group; Y 1  represents a single bond or a linking group. 
       
     
     
         2 . The monomer for self-assembly composition for pattern formation according to  claim 1 , wherein, in the formulae (103′) and (104′), at least two of R 1  each independently represent an alkyl group, an acyl group, an aryl group, or a phosphoryl group, and a plurality of R 1  may be identical to or different from one another; R 5  represents a hydrogen atom or an alkyl group; Y 1  represents a single bond or a linking group. 
     
     
         3 . The monomer for self-assembly composition for pattern formation according to  claim 1 , wherein, in the formulae (103′) and (104′), all of R 1  each independently represent an alkyl group, an acyl group, an aryl group, or a phosphoryl group 
     
     
         4 . The monomer for self-assembly composition for pattern formation according to  claim 1 , wherein, in the formulae (103′) and (104′), Y 1  represents a single bond, or, Y 1  represents an alkylene group, a phenylene group, —O—, —C(═O)—O— or a linking group formed by combining these groups. 
     
     
         5 . The monomer for self-assembly composition for pattern formation according to  claim 1 , wherein, in the formulae (103′) and (104′), Y 1  is one of the linking groups represented by the following structure.