US2021269674A1PendingUtilityA1

Polishing composition containing zirconia particles and an oxidizer

66
Assignee: FUJIMI CORPPriority: Feb 28, 2020Filed: Nov 20, 2020Published: Sep 2, 2021
Est. expiryFeb 28, 2040(~13.6 yrs left)· nominal 20-yr term from priority
Inventors:Jie Lin
C09K 3/1409C09G 1/02C01G 25/02C01P 2004/64
66
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Claims

Abstract

Provided herein are CMP compositions, and methods for polishing surfaces comprising amorphous carbon, spin-on carbon (SoC), and/or diamond like carbon (DLC) films. The CMP compositions of the present disclosure contain at least one abrasive having zirconia particles and may also contain at least one metal-containing oxidizer.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A method of increasing the removal rate of amorphous carbon, spin-on carbon (SoC), or diamond like carbon (DLC) from a surface, comprising contacting the surface with a slurry comprising an abrasive having zirconia particles and a metal-containing oxidizer, and polishing the surface. 
     
     
         2 . The method of  claim 1 , wherein the removal rate is increased when compared to a removal rate using a similar slurry composition having silica and/or a non-metal-containing oxidizer in place of zirconia particles and/or the metal-containing oxidizer. 
     
     
         3 . The method of  claim 1 , wherein the zirconia particle is an aggregate comprising primary particles. 
     
     
         4 . The method of  claim 3 , wherein the zirconia particle comprises a primary particle size with a diameter of about 8-10 nm and a secondary size of the aggregates with a diameter of about 70 nm. 
     
     
         5 . The method of  claim 1 , the metal-containing oxidizer comprises an element selected from the group consisting of manganese, cerium, vanadium, and iron. 
     
     
         6 . The method of  claim 1 , wherein the metal-containing oxidizer is selected from the group consisting of KMnO 4 , (NH 4 ) 2 Ce(NO 3 ) 6 , NaVO 3 , NH 4 VO 3 , and Fe(NO 3 ) 3 . 
     
     
         7 . The method of  claim 1 , wherein the composition has a pH of about 3 to about 6. 
     
     
         8 . The method of  claim 1 , wherein the zirconia particles are present in an amount of about 0.01 wt. % or more. 
     
     
         9 . The method of  claim 1 , wherein the zirconia particles are present in an amount of about 2.5 wt. % of less. 
     
     
         10 . The method of  claim 1 , wherein the metal-containing oxidizer is present in an amount of about 0.05 mM or more. 
     
     
         11 . The method of  claim 1 , wherein the zirconia particles comprise colloidal zirconia. 
     
     
         12 . The method of  claim 1 , wherein the zirconia particles comprise calcined zirconia. 
     
     
         13 . The method of  claim 1 , wherein the zirconia particles are doped with yttrium. 
     
     
         14 . The method of  claim 13 , zirconia particle is doped with greater than 9 mol % Y 2 O 3 . 
     
     
         15 . A chemical mechanical polishing (CMP) composition comprising colloidal zirconia particles and a metal-containing oxidizer. 
     
     
         16 . The CMP composition of  claim 15 , wherein the colloidal zirconia particle is an aggregate comprising primary particles. 
     
     
         17 . The CMP composition of  claim 16 , wherein the colloidal zirconia particle comprises a primary particle size with a diameter of about 8 to about 10 nm and a secondary size of the aggregates with a diameter of about 70 nm. 
     
     
         18 . The CMP composition of  claim 15 , wherein the metal-containing oxidizer comprises an element selected from the group consisting of manganese, cerium, vanadium, and iron. 
     
     
         19 . The CMP composition of  claim 15 , wherein the metal-containing oxidizer is selected from the group consisting of KMnO 4 , (NH 4 ) 2 Ce(NO 3 ) 6 , NaVO 3 , NH 4 VO 3 , and Fe(NO 3 ) 3 . 
     
     
         20 . The CMP composition of  claim 15 , wherein the composition has a pH of about 3 to about 6. 
     
     
         21 . The CMP composition of  claim 15 , wherein the zirconia particles are present in an amount of about 0.01 wt. % or more. 
     
     
         22 . A reaction product formed by contacting the CMP composition of  claim 15  with an amorphous carbon, spin-on carbon (SoC), or DLC surface. 
     
     
         23 . A chemical mechanical polishing (CMP) composition comprising zirconia particles doped with yttrium and a metal-containing oxidizer, wherein the particle size of the particles is less than 80 nm. 
     
     
         24 . The CMP composition of  claim 23 , wherein the zirconia particles are doped with greater than 9 mol % Y 2 O 3 .

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