Triggering Exothermic Reactions Under High Hydrogen Loading Rates

Abstract

Methods and apparatus are disclosed for triggering an exothermic reaction under a high hydrogen loading rate. It is generally understood that a high hydrogen loading ratio is an important factor. The present application teaches that a high hydrogen loading rate, that is, achieving a high hydrogen loading ratio in a short period of time, is another important factor in determining whether excess heat can be observed in an exothermic reaction. The present application discloses methods and apparatus for achieving a high hydrogen loading rate in order to trigger an exothermic reaction.

1 . A method of triggering an exothermic reaction in a reaction chamber, the reaction chamber comprising a hydrogen absorbing material, the method comprising:
 introducing a hydrogen gas into the chamber;   applying a first condition, under which the hydrogen gas is loaded into the hydrogen absorbing material at a first hydrogen loading rate during a first time period;   applying a second condition, under which the hydrogen gas is loaded into the hydrogen absorbing material at a second hydrogen loading rate during a second time period; and   initiating the exothermic reaction in the reaction chamber under the second condition;   
       wherein the second hydrogen loading rate is higher than the first hydrogen loading rate. 
     
     
         2 . The method of  claim 1 , wherein applying the first condition comprises applying a temperature T1 and a pressure P1. 
     
     
         3 . The method of  claim 1 , wherein the reaction chamber further comprises an electrode and the electrode is plated with the hydrogen absorbing material, and wherein applying the second condition comprises applying a high voltage differential between the reaction chamber and the electrode. 
     
     
         4 . The method of  claim 3 , wherein the high voltage differential ranges from 3000V to 6000V. 
     
     
         5 . The method of  claim 2 , wherein applying the second condition comprises increasing the pressure P1 within the reaction chamber from a vacuum to 100 PSI. 
     
     
         6 . The method of  claim 1 , wherein the step of applying the first condition is optional. 
     
     
         7 . The method of  claim 1 , wherein the first loading ratio or the second loading ratio is a localized loading ratio. 
     
     
         8 . The method of  claim 1 , wherein the first loading ratio or the second loading ratio is an average loading ratio. 
     
     
         9 . A device configured for triggering and sustaining an exothermic reaction, comprising:
 a reaction chamber;   a hydrogen absorbing material; and   one or more input ports for receiving a gas inlet and one or more controlling devices,   wherein a hydrogen gas is introduced into the device via the gas inlet, and   wherein the one or more controlling devices are configured to apply a first condition under which the hydrogen gas is loaded into the hydrogen absorbing material at a first hydrogen loading ratio within a first time period, and to apply a second condition under which the hydrogen gas is loaded into the hydrogen absorbing material at a second hydrogen loading ratio within a second time period, the second hydrogen loading ratio being higher than the first hydrogen loading ratio;   
       wherein the exothermic reaction is initiated under the second condition. 
     
     
         10 . The device of  claim 9 , wherein the first condition comprises a temperature T1 and a pressure P1. 
     
     
         11 . The device of  claim 9 , wherein the device further comprises an electrode and the electrode is plated with a hydrogen absorbing material, wherein the second condition comprises a high voltage differential between the device and the electrode. 
     
     
         12 . The device of  claim 11 , wherein the high voltage differential ranges from 3000V to 6000V. 
     
     
         13 . The device of  claim 9 , wherein the second condition comprises increasing the pressure P1 within the reaction chamber from a vacuum to 100 PSI. 
     
     
         14 . The device of  claim 9 , wherein the step of applying the first condition is optional. 
     
     
         15 . The device of  claim 9 , wherein the first loading ratio or the second loading ratio is a localized loading ratio. 
     
     
         16 . The device of  claim 9 , wherein the first loading ratio or the second loading ratio is an average loading ratio. 
     
     
         17 . A method of triggering an exothermic reaction in a reaction chamber, the reaction chamber comprising a hydrogen absorbing material, the method comprising:
 introducing a hydrogen gas into the reaction chamber;   applying a condition, under which the hydrogen gas is loaded into the hydrogen absorbing material to achieve a high hydrogen loading rate; and   initiating the exothermic reaction in the reaction chamber.