Modular parallel electron lithography

Abstract

Systems and methods are described herein for electron-beam lithography. In some aspects, a photo electron emitter and channel array assembly (PEECAA) may include a photo-electron emitting cathode having a uniform planar surface and an array of beam channels proximate to the cathode. In some cases, at least one of the cathode or the array of beam channels is removable from the PEECAA. The array of beam channels may include a grid of apertures, a plurality of beam channels, and a shared lens array including a plurality of lenses proximate to an exit of the plurality of beam channels. Individual apertures of the grid of apertures align with individual beam channels to allow electrons from the cathode to pass through the array of beam channels and the shared lens array to form a pixelated pattern, such that, upon exposure to the target, the pixelated pattern is permanently formed on the target.

What is claimed is: 
     
         1 . A modular lithographic system comprising:
 an electron source; and   an array of beam channels aligned with the source of electrons, the array of beam channels comprising:
 a grid of apertures; 
 a plurality of beam channels; and 
 a shared lens array comprising a plurality of uniform lenses proximate to an exit of the plurality of beam channels, wherein individual apertures of the grid of apertures align with individual beam channels of the plurality of beam channels to allow electrons from the electron source to pass through the array of beam channels and the shared lens array to form a pixelated pattern, wherein, upon exposure to the target, the pixelated pattern is formed on the target. 
   
     
     
         2 . The system of  claim 1 , further comprising an alignment mechanism removably aligning the array of beam channels with the target, wherein the alignment mechanism aligns the plurality of beam channels within 1 mm from the target. 
     
     
         3 . The system of  claim 1 , wherein the alignment mechanism removably aligns the array of beam channels with the electron source. 
     
     
         4 . The system of  claim 1 , wherein individual beam channels of the plurality of beam channels are uniformly formed in a multi-layered structure and aligned with the shared lens such that beam steering is not needed to form the pixelated pattern. 
     
     
         5 . The system of  claim 1 , wherein each of the plurality of beam channels are supplied with a substantially uniform voltage. 
     
     
         6 . The system of  claim 1 , wherein the array of beam channels comprises a replaceable modular unit. 
     
     
         7 . The system of  claim 6 , wherein a first portion of individual apertures of the grid of apertures comprise a first shape and a second portion of individual apertures of the grid of apertures comprise a second shape. 
     
     
         8 . The system of  claim 6 , wherein individual apertures of the grid of apertures comprise a first shape, and wherein the system further comprising a second array of beam channels, wherein individual apertures of the grid of apertures of the second array of beam channels comprise a second shape. 
     
     
         9 . The system of  claim 6 , further comprising a second array of beam channels, wherein at least one of a number of beam channels, at least one dimension of the array of beam channels, or spacing between individual beam channels of the plurality of beam channels varies between the array of beam channels and the second array of beam channels. 
     
     
         10 . The system of  claim 1 , where the electron source is a rear illuminated photoelectron emitter plane, wherein individual beam channels are aligned with individual light beams focused in alignment with the individual beam channels, wherein the plurality of beam channels are individually modulated. 
     
     
         11 . The system of  claim 10 , wherein the array of beam channels comprises at least one planar surface, wherein the planar surface removably engages with the rear illuminated photoelectron emitter plane. 
     
     
         12 . The system of  claim 10 , wherein the rear illuminated photoelectron emitter plane comprises a separate replaceable unit distinct from the array of beam channels, and wherein the rear illuminated photoelectron emitter plan is positioned adjacent to the array of beam channels. 
     
     
         13 . The system of  claim 1 , wherein the rear illuminated photoelectron emitter plane is directly coupled to the array of beam channels. 
     
     
         14 . The system of  claim 1 , wherein the array of beam channels comprises a pellicle layer positioned across the plurality of beam channels, wherein the pellicle layer prevents contaminants flowing through individual beam channels of the plurality of beam channels while allowing a substantial fraction of the electrons to pass through the pellicle layer. 
     
     
         15 . A modular beam channel comprising:
 a grid of apertures;   a plurality of beam channels, wherein individual beam channels of the plurality of beam channels are uniformly formed in a multi-layered structure, wherein each of the plurality of beam channels are supplied with a substantially uniform voltage; and   a shared lens array comprising a plurality of uniform lenses aligned with an exit of individual beam channels of the plurality of beam channels, wherein individual apertures of the grid of apertures align with individual beam channels of the plurality of beam channels to allow electrons to pass through the beam channel array and the shared lens array to form a pixelated pattern, wherein, upon exposure to the target, the pixelated pattern is formed on the target.   
     
     
         16 . The modular beam channel array of  claim 15 , wherein individual beam channels of the plurality of beam channels and individual lenses of the plurality of lenses are precisely aligned with the individual apertures to provide an exactly positioned source for electrons entering the individual beam channels. 
     
     
         17 . The modular beam channel array of  claim 15 , further comprising an alignment mechanism at least in part removably aligning the array of beam channels with the target. 
     
     
         18 . The modular beam channel array of  claim 15 , further comprising at least one planar surface, wherein the planar surface removably engages with an illuminated photoelectron emitter plane. 
     
     
         19 . The removable modular beam channel array of  claim 15 , further comprising a pellicle layer positioned across the plurality of beam channels, wherein the pellicle layer prevents contaminants flowing through individual beam channels of the plurality of beam channels. 
     
     
         20 . The removable modular beam channel array of  claim 15 , further comprises an illuminated photoelectron emitter plane.