Device for water supply

Abstract

The purpose of the present invention is to provide a tool for water supply, which has luster and rarely undergoes the leaching out of nickel. A tool for water supply 100 which is provided with a nickel-plated layer 102 formed on a base material 101, wherein the nickel-plated layer 102 contains no sulfur component, the corrosion potential of the nickel-plated layer 102 in a leaching solution as measured against a saturated calomel electrode is −0.01 or more (preferably +0.04 V or more), and the Wa value of the nickel-plated layer 102 as measured using a WaveScan device manufactured by BYK is 5.1 or less.

1 . A device for water supply comprising a nickel plating layer formed on a base material,
 wherein the nickel plating layer contains no sulfur component,   wherein a corrosion potential of the nickel plating layer in a leach test liquid is −0.01 V or greater with respect to a saturated calomel electrode as a reference, and   wherein a surface of the nickel plating layer has a Wa value of 5.1 or less as measured by BYK wave scan device.   
     
     
         2 . The device for water supply according to  claim 1 , wherein the corrosion potential of the nickel plating layer in the leach test liquid is +0.04 V or greater with respect to the saturated calomel electrode as the reference. 
     
     
         3 . The device for water supply according to  claim 1 , wherein the corrosion potential of the nickel plating layer in the leach test liquid is +0.02 V or greater with respect to the saturated calomel electrode as the reference. 
     
     
         4 . The device for water supply according to  claim 1 ,
 wherein the surface of the nickel plating layer has a Wa value of 3.6 or less.   
     
     
         5 . The device for water supply according to  claim 2 ,
 wherein the surface of the nickel plating layer has a Wa value of 3.6 or less.   
     
     
         6 . The device for water supply according to  claim 3 ,
 wherein the surface of the nickel plating layer has a Wa value of 3.6 or less.   
     
     
         7 . The device for water supply according to  claim 1 ,
 wherein the sulfur is not detected in an elementary analysis using an EPMA.   
     
     
         8 . The device for water supply according to  claim 2 ,
 wherein the sulfur is not detected in an elementary analysis using an EPMA.   
     
     
         9 . The device for water supply according to  claim 3 ,
 wherein the sulfur is not detected in an elementary analysis using an EPMA.