Nanoimprint lithography process using low surface energy mask

Abstract

A method is described for creating a modified mask with low surface energies for a nano-imprint lithography (NIL) imprinting process. The method includes applying a master mold to an imprint mask material to create an imprint mask. The method further includes modifying the imprint mask by applying a treatment to the imprint mask to cause a surface energy level of the imprint mask to fall below a sticking threshold. The modified imprint mask is applied to a nano-imprint lithography (NIL) material to create an imprinted NIL material layer. The surface energy level of the imprint mask causes a shape of the imprinted NIL material layer to be remain unchanged when the imprinted NIL material layer is detached from the modified imprint mask.

What is claimed is: 
     
         1 . An imprinted nano-imprint lithography (NIL) material layer manufactured by:
 applying a master mold to an imprint mask material to create an imprint mask;   forming a graphitized carbon layer on a surface of the imprint mask to cause a surface energy of the modified imprint mask to fall below a sticking threshold by:
 applying a plasma treatment to the surface of the imprinted mask, and 
 after the plasma treatment is applied to the surface of the imprinted mask, exposing the surface of the imprinted mask to ultraviolet (UV) light; and 
   applying the modified imprint mask to a nano-imprint lithography (NIL) material layer to create an imprinted NIL material layer, the surface energy level of the modified imprint mask causing a shape of the imprinted NIL material layer to remain unchanged when the imprinted NIL material layer is detached from the modified imprint mask.   
     
     
         2 . The NIL material layer of  claim 1 , wherein the plasma treatment is an application of a fluorocarbon plasma to the surface of the imprint mask. 
     
     
         3 . The NIL material layer of  claim 2 , wherein the fluorocarbon is composed of one of CF 4 , CHF 3 , CH 2 F 2 , CH 3 F, C 4 F 8 , C 4 F 6 , C 2 F 6 , and C 2 F 8 . 
     
     
         4 . The NIL material layer of  claim 1 , wherein the UV light is in a wavelength range of 10 nm to 200 nm. 
     
     
         5 . The NIL material layer of  claim 1 , wherein the imprinted NIL material layer has a modulus level beyond a strength threshold, the imprinted NIL material layer having a structure that remains unaffected by a subsequent process to form a second imprint layer matching a pattern of the master mold. 
     
     
         6 . The NIL material layer of  claim 1 , wherein the surface energy level of the modified imprint mask is less than a surface energy level of the NIL material layer. 
     
     
         7 . The NIL material layer of  claim 1 , wherein forming the graphitized carbon layer on the surface of the imprint mask to cause the surface energy of the modified imprint mask to fall below a sticking threshold further comprises:
 evacuating gas from a chamber where the imprinted mask is placed before exposing the surface of the imprinted mask to the UV light.   
     
     
         8 . The NIL material layer of  claim 1 , wherein manufacturing of the NIL material layer further comprises:
 measuring the surface energy of the modified imprinted mask; and   determining that the surface energy of the modified imprinted mask is below the sticking threshold before applying the modified imprint mask to the NIL material layer.   
     
     
         9 . The NIL material layer of  claim 1 , wherein manufacturing of the NIL material layer further comprises:
 etching the imprinted NIL material layer to increase prominence of a pattern of the imprinted NIL material layer.   
     
     
         10 . The NIL material layer of  claim 1 , wherein manufacturing of the NIL material layer further comprises:
 inducing cross linkage of polymers of the imprinted mask material to further cause the surface energy of the modified imprint mask to fall below a sticking threshold.   
     
     
         11 . A nano-imprint lithography (NIL) imprinting system, comprising:
 a modified imprint mask creation system to created a modified imprint mask;   a NIL imprinting system configured to apply the modified imprint mask to a NIL material layer;   a NIL post-processing system configured to perform post-processing operations on an imprinted NIL material layer; and   a controller to transmit instructions to the NIL imprinting system configured to:
 apply a master mold to an imprint mask material to create an imprint mask; 
 form a graphitized carbon layer on a surface of the imprint mask to cause a surface energy of the modified imprint mask to fall below a sticking threshold by: 
 applying a plasma treatment to the surface of the imprinted mask, and 
 after the plasma treatment is applied to the surface of the imprinted mask, exposing the surface of the imprinted mask to ultraviolet (UV) light; and 
 apply the modified imprint mask to a nano-imprint lithography (NIL) material layer to create an imprinted NIL material layer, the surface energy level of the modified imprint mask causing a shape of the imprinted NIL material layer to remain unchanged when the imprinted ML material layer is detached from the modified imprint mask. 
   
     
     
         12 . The system of  claim 11 , wherein the plasma treatment is an application of a fluorocarbon plasma to the surface of the imprint mask. 
     
     
         13 . The system of  claim 12 , wherein the fluorocarbon is composed of one of CF 4 , CHF 3 , CH 2 F 2 , CH 3 F, C 4 F 8 , C 4 F 6 , C 2 F 6 , and C 2 F 8 . 
     
     
         14 . The system of  claim 13 , wherein the UV light is in a frequency range of 10 nm to 200 nm. 
     
     
         15 . The system of  claim 11 , wherein the imprinted NIL material layer has a modulus level beyond a strength threshold, the imprinted NIL material layer having a structure that remains unaffected by a subsequent process to form a second imprint layer matching a pattern of the master mold. 
     
     
         16 . The system of  claim 11 , wherein the surface energy level of the modified imprint mask is less than a surface energy level of the NIL material.