3d printing with variable voxel sizes
Abstract
Methods, systems, and apparatus for multi-scale stereolithography. The apparatus includes a light source for providing a laser beam having a first shape and a first size. The apparatus includes a dynamic aperture having multiple apertures that are of the same or different sizes or shapes. The dynamic aperture is configured to receive the laser beam and modify at least one of the shape or the size of the laser beam. The apparatus includes a platform for holding an object to be printed. The apparatus includes a processor connected to at least one of the light source, the dynamic aperture or the platform. The processor is configured to move the platform to direct the laser beam or direct the laser beam to cure resin onto the object to be printed using a first aperture of the multiple apertures to form the object.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A multi-scale stereolithography apparatus, comprising:
a light source; a dynamic aperture positioned after the light source; one or more lenses positioned before or after the dynamic aperture; one or more mirrors positioned after the dynamic aperture; a stage connected to the dynamic aperture; and a processor connected to at least one of the light source, the dynamic aperture or the stage.
2 . The multi-scale stereolithography apparatus of claim 1 , wherein the one or more lenses is positioned before the dynamic aperture to narrow an original light beam before the original light beam enters the dynamic aperture.
3 . The multi-scale stereolithography apparatus of claim 1 , wherein the stage is configured to move based on a toolpath adapted to optimize resolution or speed along an XY plane of a layer of a fabricated part.
4 . The multi-scale stereolithography apparatus of claim 1 , wherein the one or more lenses is positioned before the dynamic aperture to narrow an original light beam before the original light beam enters the dynamic aperture and wherein the stage is configured to move based on a toolpath adapted to optimize resolution or speed along an XY plane of a layer of a fabricated part.
5 . The multi-scale stereolithography apparatus of claim 1 , wherein the light source produces a light beam having a first dimension at a first time point and a second dimension at a second time point.
6 . The multi-scale stereolithography apparatus of claim 1 , wherein the stage is a linear or rotary stage.
7 . The multi-scale stereolithography apparatus of claim 1 , wherein the dynamic aperture has a plurality of apertures that are of different sizes or shapes.
8 . The multi-scale stereolithography apparatus of claim 1 , wherein the dynamic aperture has a first aperture at a first time point and a second aperture at a second time point.
9 . The multi-scale stereolithography apparatus of claim 1 , further comprising a resin tank interfacing with the one or more mirrors.
10 . The multi-scale stereolithography apparatus of claim 1 , wherein the light source produces a light beam and the light beam is configured to cure resin in a resin tank to create a portion of a fabricated part.
11 . The multi-scale stereolithography apparatus of claim 9 , further comprising a platform interfacing with the light source.
12 . A multi-scale stereolithography apparatus, comprising:
a beam optics device, the beam optics device including
a light source,
a dynamic aperture,
one or more mirrors,
one or more lenses, and
a stage; and
a processor connected to the beam optics device.
13 . The multi-scale stereolithography apparatus of claim 12 , wherein the one or more lenses is positioned before the dynamic aperture.
14 . The multi-scale stereolithography apparatus of claim 12 , wherein the light source produces a plurality of light beams and the plurality of light beams cures a resin onto a printed object, the resin having a first thickness when a first light beam is used and the resin having a second thickness when a second light beam is used.
15 . The multi-scale stereolithography apparatus of claim 12 , wherein the dynamic aperture has a first aperture that allows a small-scale light source to pass through and a second aperture that allows a large-scale light source to pass through.
16 . The multi-scale stereolithography apparatus of claim 12 , further comprising a resin tank interfacing with the beam optics device and a platform interfacing with the beam optics device the platform holding a printed object.
17 . The multi-scale stereolithography apparatus of claim 12 , wherein the stage is at a first position at a first time point and a second position at a second time point to modify a shape or a size of a first laser beam to a second laser beam with a shape or a size that is different than the shape or size of the first laser beam.
18 . A multi-scale stereolithography apparatus, comprising:
a light source for providing a laser beam having a first shape and a first size; a dynamic aperture having a plurality of apertures that are of different sizes or shapes, the dynamic aperture configured to:
receive the laser beam, and
modify at least one of the shape or the size of the laser beam;
a platform for holding an object to be printed; and a processor connected to at least one of the light source, the dynamic aperture or the platform and configured to:
move the platform or direct the laser beam to cure resin onto the object to be
printed using a first aperture of the plurality of apertures to form the object.
19 . The multi-scale stereolithography apparatus of claim 18 , further comprising one or more lenses for narrowing an original laser beam prior to modifying the original laser beam.
20 . The multi-scale stereolithography apparatus of claim 18 , further comprising one or more mirrors that direct the laser beam at the resin to cure the resin onto the object to be printed.Join the waitlist — get patent alerts
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